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EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity
Publication:
EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity
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Date
2020
Proceedings Paper
https://doi.org/10.1117/12.2552166
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Nagahara, S.
;
Dinh, C.Q.
;
Yoshida, Keisuke
;
Shiraishi, G.
;
Kondo, Y.
;
Yoshihara, K.
;
Nafus, Kathleen
;
Petersen, John
;
De Simone, Danilo
;
Foubert, Philippe
;
Vandenberghe, Geert
;
Stock, H.
;
Meliorisz, B.
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1966
since deposited on 2021-10-29
Acq. date: 2025-12-14
Citations
Metrics
Views
1966
since deposited on 2021-10-29
Acq. date: 2025-12-14
Citations