Authors
Nagahara, S.;
Dinh, C.Q.;
Yoshida, Keisuke;
Shiraishi, G.;
Kondo, Y.;
Yoshihara, K.;
Nafus, Kathleen;
Petersen, John;
De Simone, Danilo;
Foubert, Philippe;
Vandenberghe, Geert;
Stock, H.;
Meliorisz, B.
Conference
Advances in Patterning Materials and Processes XXXVII
Title
EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity
Publication type
Proceedings paper
