Browsing by author "Yoshihara, K."

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EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity

Nagahara, S.; Dinh, C.Q.; Yoshida, Keisuke; Shiraishi, G.; Kondo, Y.; Yoshihara, K.; Nafus, Kathleen; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert; Stock, H.; Meliorisz, B. (2020)
Investigation of EUV process sensitivities for wafer track processing

Bradon, Neil; Weichert, Heiko; Nafus, Kathleen; Hatakeyama, Shinichi; Kitano, J.; Kosugi, H.; Yoshihara, K.; Goethals, Mieke; Hermans, Jan (2009)