Browsing by author "Petersen, John"
Now showing items 1-15 of 15
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A Laboratory Light Source for Ultrafast Kinetics of EUV Exposure Processes and Ultra-Small Pitch Lithography
Cousin, Seth L.; Bargsten, Clayton; Rinard, Eric; Ward, Rod; Hosler, Erik; Petersen, Brennan; Kapteyn, Henity; Vanelderen, Pieter; Petersen, John; van der Heide, Paul (2020) -
A scientific framework for establishing ultrafast molecular dynamic research in imec's AttoLab
Galleni, Laura; Sajjadian, Faegheh; Conard, Thierry; Pollentier, Ivan; Dorney, Kevin; Holzmeier, Fabian; Witting Larsen, Esben; Escudero, Daniel; Pourtois, Geoffrey; van Setten, Michiel; van der Heide, Paul; Petersen, John (2023) -
Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry
Dorney, Kevin; Kissoon, Nicola; Holzmeier, Fabian; Witting Larsen, Esben; Singh, Dhirendra; Arvind, Shikhar; Santra, Sayantani; Fallica, Roberto; Makhotkin, Igor; Philipsen, Vicky; De Gendt, Stefan; Fleischmann, Claudia; van der Heide, Paul; Petersen, John (2023-04-28) -
Actinic photoemission spectroscopy of litho materials using a table-top ultrafast EUV source
Singh, Dhirendra; Dorney, Kevin; Holzmeier, Fabian; Witting Larsen, Esben; Galleni, Laura; Mokhtarzadeh, Charles; van Setten, Michiel; Conard, Thierry; Petersen, John; van der Heide, Paul (2024) -
Calibrated PSCAR stochastic simulation
Dinh, Cong Que; Nagahara, Seji; Shiraishi, Gousuke; Minekawa, Yukie; Kamei, Yuya; Carcasi, Michael; Ide, Hiroyuki; Kondo, Yoshihiro; Yoshida, Yuichi; Yoshihara, Kosuke; Shimada, Ryo; Tomono, Masaru; Moriya, Teruhiko; Takeshita, Kazuhiro; Nafus, Kathleen; Biesemans, Serge; Petersen, John; De Simone, Danilo; Foubert, Philippe; De Bisschop, Peter; Vandenberghe, Geert; Stock, Hans-Jurgen; Meliorisz, Balint (2019) -
Dissociative photoionization of EUV lithography photoresist models
Gentile, Marzio; Gerlach, Marius; Richter, Robert; van Setten, Michiel; Petersen, John; van der Heide, Paul; Holzmeier, Fabian (2023) -
Elucidating complex triplet-state dynamics in the model system isopropylthioxanthone
Liaros, Nikolaos; Gutierrez Razo, Sandra A.; Thum, Matthew D.; Ogden, Hannah M.; Zeppuhar, Andrea N.; Wolf, Steven; Baldacchini, Tommaso; Kelley, Matthew J.; Petersen, John; Falvey, Daniel E.; Mullin, Amy S.; Fourkas, John T. (2022) -
EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing
Dinh, Cong Que; Nagahara, Seiji; Kuwahara, Yuhei; Dauendorffer, Arnaud; Yoshida, Keisuke; Okada, Soichiro; Onitsuka, Tomoya; Kawakami, Shinichiro; Shimura, Satoru; Muramatsu, Makoto; Yoshihara, Kosuke; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert; Huli, Lior; Grzeskowiak, Steven; Krawicz, Alexandra; Bae, Nayoung; Kato, Kanzo; Nafus, Kathleen; Raley, Angelique (2022) -
EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity
Nagahara, S.; Dinh, C.Q.; Yoshida, Keisuke; Shiraishi, G.; Kondo, Y.; Yoshihara, K.; Nafus, Kathleen; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert; Stock, H.; Meliorisz, B. (2020) -
EUV resist performance enhancement by UV flood exposure for high NA EUV lithography
Cong Que Dinh; Nagahara, Seiji; Yoshida, Keisuke; Kondo, Yoshihiro; Muramatsu, Makoto; Yoshihara, Kosuke; Shimada, Ryo; Moriya, Teruhiko; Nafus, Kathleen; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert (2021) -
Grand Challenges in Nanofabrication: There Remains Plenty of Room at the Bottom
Fourkas, John. T. T.; Gao, Jinwei; Han, Zheng; Liu, Haitao; Marmiroli, Benedetta; Naughton, Michael. J. J.; Petersen, John; Sun, Yong; Pret, Alex Vagilio; Zheng, Yuebing (2021) -
Impact of vacuum ultraviolet photons on ultrathin polymethylmethacrylate during plasma etching
Arvind, Shikhar; Witting Larsen, Esben; Bezard, Philippe; Petersen, John; De Gendt, Stefan (2024) -
Introduction to imec's AttoLab for ultrafast kinetics of EUV exposure processes and ultra-small pitch lithography
Holzmeier, Fabian; Dorney, Kevin; Witting Larsen, Esben; Nuytten, Thomas; Singh, Dhirendra; van Setten, Michiel; Vanelderen, Pieter; Bargsten, Clayton; Cousin, Seth; Raymondson, Daisy; Rinard, Eric; Ward, Rod; Kapteyn, Henry; Bottcher, Stefan; Dyachenko, Oleksiy; Kremzow, Raimund; Wietstruk, Marko; Pourtois, Geoffrey; van der Heide, Paul; Petersen, John (2021-02-22) -
Lloyd's Mirror Interference Lithography Below a 22-nm Pitch with an Accessible, Table-top, 13.5 nm High-Harmonic EUV Source
Dorney, Kevin; Castellanos, Sonia; Witting Larsen, Esben; Holzmeier, Fabian; Singh, Dhirendra Pratap; Vandenbroeck, Nadia; De Simone, Danilo; De Schepper, Peter; Vaglio Pret, Alessandro; Bargsten, Clayton; Cousin, Seth; Raymondson, Daisy; Rinard, Eric; Ward, Rod; Kapteyn, Henry; Nuytten, Thomas; van der Heide, Paul; Petersen, John (2021) -
Unraveling the EUV photoresist reactions : which, how much, and how do they relate to printing performance
Pollentier, Ivan; Petersen, John; De Bisschop, Peter; De Simone, Danilo; Vandenberghe, Geert (2019)