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Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry
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Authors
Dorney, Kevin
;
Kissoon, Nicola
;
Holzmeier, Fabian
;
Witting Larsen, Esben
;
Singh, Dhirendra
;
Arvind, Shikhar
;
Santra, Sayantani
;
Fallica, Roberto
;
Makhotkin, Igor
;
Philipsen, Vicky
;
De Gendt, Stefan
;
Fleischmann, Claudia
;
van der Heide, Paul
;
Petersen, John
DOI
http://dx.doi.org/10.1117/12.2658359
ISSN
1996-756X
Conference
SPIE Advanced Lithography + Patterning
Journal
Proc. SPIE 12494, Optical and EUV Nanolithography XXXVI
Title
Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry
Publication type
Proceedings paper
Embargo date
2023-05-22
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Summary
2
20.500.12860/41605.2
*
2023-05-23T10:11:07Z
validation by library/open access desk
1
20.500.12860/41605
2023-05-22T14:55:34Z
*Selected version
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