Browsing by author "Makhotkin, Igor"
Now showing items 1-7 of 7
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Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry
Dorney, Kevin; Kissoon, Nicola; Holzmeier, Fabian; Witting Larsen, Esben; Singh, Dhirendra; Arvind, Shikhar; Santra, Sayantani; Fallica, Roberto; Makhotkin, Igor; Philipsen, Vicky; De Gendt, Stefan; Fleischmann, Claudia; van der Heide, Paul; Petersen, John (2023-04-28) -
Advancing X-ray metrology for routine thin film analysis
Makhotkin, Igor; Fathabad, Zahra; Yakunin, Sergey; van de Kruijs, Robbert; Philipsen, Vicky; Luong, Vu; Bijkerk, Fred (2018) -
APT tip shape modifications during analysis, its implications, and the potential to measure tip shapes in real time via soft-X-ray ptychography
van der Heide, Paul; Makhotkin, Igor; Vandervorst, Wilfried; Fleischmann, Claudia (2019) -
High NA EUV lithography simulation using new calibrated mask model
Wu, Meiyi; Makhotkin, Igor; Philipsen, Vicky; Soltwisch, Victor; Scholze, Frank (2019) -
Opportunities and challenges in APT metrology for semiconductor applications
Fleischmann, Claudia; Cuduvally, Ramya; Morris, Richard; Melkonyan, Davit; Op de Beeck, Jonathan; Makhotkin, Igor; van der Heide, Paul; Vandervorst, Wilfried (2019) -
Refined extreme ultraviolet mask stack model
Makhotkin, Igor; Wu, Meiyi; Soltwisch, V.; Scholze, F.; Philipsen, Vicky (2021) -
The refined EUVL mask model
Makhotkin, Igor; Wu, Meiyi; Philipsen, Vicky; Soltwisch, Victor; Scholze, Frank (2019)