Browsing by author "Philipsen, Vicky"
Now showing items 1-20 of 127
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22nm node imaging and beyond: a comparison of EUV and ArFi double patterning
van Setten, Eelco; Mouraille, O.; Wittebrood, F.; Dusa, Mircea; van Ingen-Schenau, Koen; Finders, Jo; Feenstra, Kees; Bekaert, Joost; Laenens, Bart; Philipsen, Vicky; Ercken, Monique; Hendrickx, Eric; Vandenberghe, Geert (2010) -
22nm node imaging and beyond: When will EUV take over?
van Setten, Eelco; Mouraille, Orion; Wittebrood, Friso; Dusa, Mircea; van Ingen-Schenau, Koen; Finders, Jo; Feenstra, Kees; Bekaert, Joost; Laenens, Bart; Philipsen, Vicky; Ercken, Monique; Hendrickx, Eric; Vandenberghe, Geert (2010) -
3D Mask modeling for EUV lithography
Mailfert, Julien; Zuniga, Christian; Philipsen, Vicky; Adam, Konstantinos; Lam, Michael; Word, James; Hendrickx, Eric; Vandenberghe, Geert; Smith, Bruce (2012) -
A method of image-based aberration metrology for EUVL tools
Levinson, Zac; Raghunathan, Sudhar; Verduijn, Erik; Wood, Obert; Mangat, Pawitter; Goldberg, Kenneth; Benk, Markus; Wojdyla, Antoine; Philipsen, Vicky; Hendrickx, Eric; Smith, Bruce (2015) -
A printability study for phase-shift masks at 193nm lithography
Philipsen, Vicky; Jonckheere, Rik (2003) -
Actinic characterization and modeling of the EUV mask stack
Philipsen, Vicky; Hendrickx, Eric; Jonckheere, Rik; Davydova, Natalia; Fliervoet, Timon; Neumann, Jens Timo (2013) -
Actinic characterization of EUV photomasks by EUV scatterometry
Scholze, Frank; Soltwisch, Victor; Ullrich, A.; Philipsen, Vicky; Burger, Sven (2015) -
Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry
Dorney, Kevin; Kissoon, Nicola; Holzmeier, Fabian; Witting Larsen, Esben; Singh, Dhirendra; Arvind, Shikhar; Santra, Sayantani; Fallica, Roberto; Makhotkin, Igor; Philipsen, Vicky; De Gendt, Stefan; Fleischmann, Claudia; van der Heide, Paul; Petersen, John (2023-04-28) -
Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: an overview of preliminary results
Hourd, Andrew C.; Grimshaw, Anthony; Scheuring, Gerd; Gittinger, Christian; Brück, Hans-Jürgen; Chen, Shiuh-Bin; Chen, Parkson W.; Hartmann, Hans; Ordynskyy, Vladimir; Jonckheere, Rik; Philipsen, Vicky; Schätz, Thomas; Sommer, Karl (2002) -
Advancing X-ray metrology for routine thin film analysis
Makhotkin, Igor; Fathabad, Zahra; Yakunin, Sergey; van de Kruijs, Robbert; Philipsen, Vicky; Luong, Vu; Bijkerk, Fred (2018) -
Aerial image simulations of soft and phase defects in 193-nm lithography for 10-nm node
Driessen, Frank; Philipsen, Vicky; Jonckheere, Rik; Liu, Hua-Yu; Karklin, Linard (2002) -
Alternative EUV mask technology for mask 3D effect compensation
Van Look, Lieve; Philipsen, Vicky; Hendrickx, Eric; Vandenberghe, Geert; Knops, Roel; Davydova, Natalia; Wittebrood, Friso; De Kruif, Robert; Van Oosten, Anton; Fliervoet, Timon; Van Schoot, Jan; Neumann, Jens Timo (2014) -
Alternative EUV mask technology to compensate for mask 3D effects
Van Look, Lieve; Philipsen, Vicky; Hendrickx, Eric; Vandenberghe, Geert; Davydova, Natalia; Wittebrood, Friso; De Kruif, Robert; Van Oosten, Anton; Miyazaki, Junji; Fliervoet, Timon; Van Schoot, Jan; Neumann, Jens Timo (2015) -
Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks
Wood, Obert; Raghunathan, Sudhar; Mangat, Pawitter; Philipsen, Vicky; Luong, Vu; Kearney, Patrick; Verduijn, Erik; Kumar, Aditya; Patil, Suraj; Laubis, Christian; Soltwisch, Victor; Scholze, Frank (2015) -
Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography
Luong, Vu; Philipsen, Vicky; Opsomer, Karl; Rip, Jens; Hendrickx, Eric; Heyns, Marc; Detavernier, Christophe; Laubis, Christian; Scholze, Frank (2019) -
Assessment of OPC effectiveness using two-dimensional metrics
Wiaux, Vincent; Philipsen, Vicky; Jonckheere, Rik; Vandenberghe, Geert; Verhaegen, Staf; Hoffmann, Thomas; Ronse, Kurt; Howard, William B.; Maurer, Wilhelm; Preil, Moshe E. (2002) -
Assist features: placement, impact and relevance
Mochi, Iacopo; Philipsen, Vicky; Gallagher, Emily; Hendrickx, Eric; Lyakhova, Kateryna; Wittebrood, Friso; Schiffelers, Guido; Fliervoet, Timon; Wang, Shibing; Hsu, Stephen; Plachecki, Vince; Baron, Stan; Laenens, Bart (2016) -
Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?
Erdmann, Andreas; Evanschitzky, Peter; Mesilhy, Hazem; Philipsen, Vicky; Hendrickx, Eric; Bauer, Markus (2018) -
Attenuated PSM for EUV: Can they mitigate 3D mask effects?
Erdmann, Andreas; Evanschitzky, Peter; Mesilhy, Hazem; Philipsen, Vicky; Hendrickx, Eric; Bauer, Markus (2018) -
Calibration and verification of a stochastic model for EUV resist
Gao, Weimin; Philippou, Alexander; Klostermann, Ulrich; Siebert, Joachim; Philipsen, Vicky; Hendrickx, Eric; Vandeweyer, Tom; Jonckheere, Rik (2012)