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Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: an overview of preliminary results
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Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: an overview of preliminary results
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Date
2002
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Hourd, Andrew C.
;
Grimshaw, Anthony
;
Scheuring, Gerd
;
Gittinger, Christian
;
Brück, Hans-Jürgen
;
Chen, Shiuh-Bin
;
Chen, Parkson W.
;
Hartmann, Hans
;
Ordynskyy, Vladimir
;
Jonckheere, Rik
;
Philipsen, Vicky
;
Schätz, Thomas
;
Sommer, Karl
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1950
since deposited on 2021-10-14
Acq. date: 2026-03-01
Citations
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Views
1950
since deposited on 2021-10-14
Acq. date: 2026-03-01
Citations