Authors

Hourd, Andrew C.; Grimshaw, Anthony; Scheuring, Gerd; Gittinger, Christian; Brück, Hans-Jürgen; Chen, Shiuh-Bin; Chen, Parkson W.; Hartmann, Hans; Ordynskyy, Vladimir; Jonckheere, Rik; Philipsen, Vicky; Schätz, Thomas; Sommer, Karl

Conference

18th European Conference on Mask Technology for Integrated Circuits and Microcomponents

Title

Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: an overview of preliminary results

Publication type

Proceedings paper