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Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks
Publication:
Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks
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Date
2015
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Wood, Obert
;
Raghunathan, Sudhar
;
Mangat, Pawitter
;
Philipsen, Vicky
;
Luong, Vu
;
Kearney, Patrick
;
Verduijn, Erik
;
Kumar, Aditya
;
Patil, Suraj
;
Laubis, Christian
;
Soltwisch, Victor
;
Scholze, Frank
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1893
since deposited on 2021-10-23
Acq. date: 2025-12-10
Citations
Metrics
Views
1893
since deposited on 2021-10-23
Acq. date: 2025-12-10
Citations