Publication:

Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks

Date

2015
Proceedings Paper
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dc.contributor.authorWood, Obert
dc.contributor.authorRaghunathan, Sudhar
dc.contributor.authorMangat, Pawitter
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorLuong, Vu
dc.contributor.authorKearney, Patrick
dc.contributor.authorVerduijn, Erik
dc.contributor.authorKumar, Aditya
dc.contributor.authorPatil, Suraj
dc.contributor.authorLaubis, Christian
dc.contributor.authorSoltwisch, Victor
dc.contributor.authorScholze, Frank
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorLuong, Vu
dc.contributor.imecauthorVerduijn, Erik
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned2021-10-23T01:04:44Z
dc.date.available2021-10-23T01:04:44Z
dc.date.embargo9999-12-31
dc.date.issued2015
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26184
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2208395
dc.source.beginpage94220I
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VI
dc.source.conferencedate22/02/2015
dc.source.conferencelocationSan Jose, CA USA
dc.title

Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks

dc.typeProceedings paper
dspace.entity.typePublication
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