Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Conference contributions
Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks
Publication:
Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks
Date
2015
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
31565.pdf
4.52 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Wood, Obert
;
Raghunathan, Sudhar
;
Mangat, Pawitter
;
Philipsen, Vicky
;
Luong, Vu
;
Kearney, Patrick
;
Verduijn, Erik
;
Kumar, Aditya
;
Patil, Suraj
;
Laubis, Christian
;
Soltwisch, Victor
;
Scholze, Frank
Journal
Abstract
Description
Metrics
Views
1893
since deposited on 2021-10-23
Acq. date: 2025-10-23
Citations
Metrics
Views
1893
since deposited on 2021-10-23
Acq. date: 2025-10-23
Citations