Aerial image simulations of soft and phase defects in 193-nm lithography for 10-nm node

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Authors
Driessen, Frank; Philipsen, Vicky; Jonckheere, Rik; Liu, Hua-Yu; Karklin, Linard
Conference
Optical Microlithography XV
Title
Aerial image simulations of soft and phase defects in 193-nm lithography for 10-nm node
Publication type
Proceedings paper
Embargo date
9999-12-31
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