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Aerial image simulations of soft and phase defects in 193-nm lithography for 10-nm node
Publication:
Aerial image simulations of soft and phase defects in 193-nm lithography for 10-nm node
Date
2002
Proceedings Paper
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6207.pdf
1.89 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Driessen, Frank
;
Philipsen, Vicky
;
Jonckheere, Rik
;
Liu, Hua-Yu
;
Karklin, Linard
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Abstract
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1939
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations
Metrics
Views
1939
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations