Publication:

Aerial image simulations of soft and phase defects in 193-nm lithography for 10-nm node

Date

2002

Proceedings Paper

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Files

6207.pdf 1.89 MB

Author(s)

Driessen, Frank

;

Philipsen, Vicky

;

Jonckheere, Rik

;

;

Karklin, Linard

Statistics

1943 since deposited on 2021-10-14

Acq. date: 2026-01-26