Browsing by author "Holzmeier, Fabian"
Now showing items 1-10 of 10
-
A scientific framework for establishing ultrafast molecular dynamic research in imec's AttoLab
Galleni, Laura; Sajjadian, Faegheh; Conard, Thierry; Pollentier, Ivan; Dorney, Kevin; Holzmeier, Fabian; Witting Larsen, Esben; Escudero, Daniel; Pourtois, Geoffrey; van Setten, Michiel; van der Heide, Paul; Petersen, John (2023) -
A scientific framework for establishing ultrafast molecular dynamic research in imec's AttoLab
Galleni, Laura; Sajjadian, Faegheh; Conard, Thierry; Pollentier, Ivan; Dorney, Kevin; Holzmeier, Fabian; Witting Larsen, Esben; Escudero, Daniel; Pourtois, Geoffrey; van Setten, Michiel; van der Heide, Paul; Petersen, John (2023-04-30) -
Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry
Dorney, Kevin; Kissoon, Nicola; Holzmeier, Fabian; Witting Larsen, Esben; Singh, Dhirendra; Arvind, Shikhar; Santra, Sayantani; Fallica, Roberto; Makhotkin, Igor; Philipsen, Vicky; De Gendt, Stefan; Fleischmann, Claudia; van der Heide, Paul; Petersen, John (2023-04-28) -
Dissociative photoionization of EUV lithography photoresist models
Gentile, Marzio; Gerlach, Marius; Richter, Robert; van Setten, Michiel; Petersen, John; van der Heide, Paul; Holzmeier, Fabian (2023) -
Fragmentation of isocyanic acid, HNCO, following core excitation and ionization
Gerlach, Marius; Fantuzzi, Felipe; Wohlfart, Lilith; Kopp, Karina; Engels, Bernd; Bozek, John; Nicolas, Christophe; Mayer, Dennis; Guehr, Markus; Holzmeier, Fabian; Fischer, Ingo (2021) -
Influence of shape resonances on the angular dependence of molecular photoionization delays
Joseph, J.; Houver, J. C.; Lebech, M.; Dowek, D.; Lucchese, R. R.; Holzmeier, Fabian (2021) -
Introduction to imec's AttoLab for ultrafast kinetics of EUV exposure processes and ultra-small pitch lithography
Holzmeier, Fabian; Dorney, Kevin; Witting Larsen, Esben; Nuytten, Thomas; Singh, Dhirendra; van Setten, Michiel; Vanelderen, Pieter; Bargsten, Clayton; Cousin, Seth; Raymondson, Daisy; Rinard, Eric; Ward, Rod; Kapteyn, Henry; Bottcher, Stefan; Dyachenko, Oleksiy; Kremzow, Raimund; Wietstruk, Marko; Pourtois, Geoffrey; van der Heide, Paul; Petersen, John (2021-02-22) -
Lloyd's Mirror Interference Lithography Below a 22-nm Pitch with an Accessible, Table-top, 13.5 nm High-Harmonic EUV Source
Dorney, Kevin; Castellanos, Sonia; Witting Larsen, Esben; Holzmeier, Fabian; Singh, Dhirendra Pratap; Vandenbroeck, Nadia; De Simone, Danilo; De Schepper, Peter; Vaglio Pret, Alessandro; Bargsten, Clayton; Cousin, Seth; Raymondson, Daisy; Rinard, Eric; Ward, Rod; Kapteyn, Henry; Nuytten, Thomas; van der Heide, Paul; Petersen, John (2021) -
Photoemission spectroscopy on photoresist materials: A protocol for analysis of radiation sensitive materials
Sajjadian, Faegheh; Galleni, Laura; Dorney, Kevin; Singh, Dhirendra; Holzmeier, Fabian; van Setten, Michiel; De Gendt, Stefan; Conard, Thierry (2023) -
X-ray induced fragmentation of fulminic acid, HCNO
Gerlach, Marius; Schaffner, Dorothee; Preitschopf, Tobias; Karaev, Emil; Bozek, John; Holzmeier, Fabian; Fischer, Ingo (2023)