Toggle navigation
My submissions
Login
Toggle navigation
View item
imec Publications Repository
imec Publications
Presentations
View item
imec Publications Repository
imec Publications
Presentations
View item
JavaScript is disabled for your browser. Some features of this site may not work without it.
Introduction to imec's AttoLab for ultrafast kinetics of EUV exposure processes and ultra-small pitch lithography
Metadata
Show full item record
Authors
Holzmeier, Fabian
;
Dorney, Kevin
;
Witting Larsen, Esben
;
Nuytten, Thomas
;
Singh, Dhirendra
;
van Setten, Michiel
;
Vanelderen, Pieter
;
Bargsten, Clayton
;
Cousin, Seth
;
Raymondson, Daisy
;
Rinard, Eric
;
Ward, Rod
;
Kapteyn, Henry
;
Bottcher, Stefan
;
Dyachenko, Oleksiy
;
Kremzow, Raimund
;
Wietstruk, Marko
;
Pourtois, Geoffrey
;
van der Heide, Paul
;
Petersen, John
DOI
https://doi.org/10.1117/12.2595038
Conference
SPIE Advanced Lithography 2021, Novel Patterning Technologies
Title
Introduction to imec's AttoLab for ultrafast kinetics of EUV exposure processes and ultra-small pitch lithography
Publication type
Oral presentation
Collections
Presentations
Version history
Version
Item
Date
Summary
2
20.500.12860/41731.2
*
2023-08-10T12:22:49Z
validation by library/open access desk
1
20.500.12860/41731
2023-06-13T20:51:05Z
*Selected version
Search imec Publications Repository
This collection
Browse
All of imec Publications Repository
Collections
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
This collection
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
My account
login