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Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry

dc.contributor.authorDorney, Kevin
dc.contributor.authorKissoon, Nicola
dc.contributor.authorHolzmeier, Fabian
dc.contributor.authorWitting Larsen, Esben
dc.contributor.authorSingh, Dhirendra
dc.contributor.authorArvind, Shikhar
dc.contributor.authorSantra, Sayantani
dc.contributor.authorFallica, Roberto
dc.contributor.authorMakhotkin, Igor
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorFleischmann, Claudia
dc.contributor.authorvan der Heide, Paul
dc.contributor.authorPetersen, John
dc.date.accessioned2023-05-23T10:14:23Z
dc.date.available2023-05-22T14:55:34Z
dc.date.available2023-05-23T10:14:23Z
dc.date.issued2023-04-28
dc.identifier.issn1996-756X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/41605.2
dc.titleActinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry
dc.typeProceedings paper
dc.contributor.imecauthorDorney, Kevin
dc.contributor.imecauthorKissoon, Nicola
dc.contributor.imecauthorHolzmeier, Fabian
dc.contributor.imecauthorWitting Larsen, Esben
dc.contributor.imecauthorSingh, Dhirendra
dc.contributor.imecauthorArvind, Shikhar
dc.contributor.imecauthorSantra, Sayantani
dc.contributor.imecauthorFallica, Roberto
dc.contributor.imecauthorMakhotkin, Igor
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorFleischmann, Claudia
dc.contributor.imecauthorvan der Heide, Paul
dc.contributor.imecauthorPetersen, John
dc.contributor.orcidimecDorney, Kevin::0000-0003-2097-6994
dc.contributor.orcidimecHolzmeier, Fabian::0000-0001-8749-5330
dc.contributor.orcidimecWitting Larsen, Esben::0000-0002-6294-0896
dc.contributor.orcidimecSingh, Dhirendra::0000-0002-8855-0597
dc.contributor.orcidimecFallica, Roberto::0000-0003-4523-9624
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecFleischmann, Claudia::0000-0003-1531-6916
dc.contributor.orcidimecvan der Heide, Paul::0000-0001-6292-0329
dc.date.embargo2023-05-22
dc.identifier.doihttp://dx.doi.org/10.1117/12.2658359
dc.source.numberofpages10
dc.source.peerreviewyes
dc.source.beginpage1249407-1
dc.source.endpage1249407-10
dc.source.conferenceSPIE Advanced Lithography + Patterning
dc.source.conferencedate2023
dc.source.conferencelocationSan Jose, California, United States
dc.source.journalProc. SPIE 12494, Optical and EUV Nanolithography XXXVI
imec.availabilityPublished - open access


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