A Laboratory Light Source for Ultrafast Kinetics of EUV Exposure Processes and Ultra-Small Pitch Lithography

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Authors
Cousin, Seth L.; Bargsten, Clayton; Rinard, Eric; Ward, Rod; Hosler, Erik; Petersen, Brennan; Kapteyn, Henity; Vanelderen, Pieter; Petersen, John; van der Heide, Paul
EISBN
978-1-943580-76-7
ISSN
2160-9020
Conference
Conference on Lasers and Electro-Optics (CLEO)
Journal
na
Title
A Laboratory Light Source for Ultrafast Kinetics of EUV Exposure Processes and Ultra-Small Pitch Lithography
Publication type
Proceedings paper
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220.500.12860/38187.2*2022-01-25T09:22:37Zvalidation by library/open access desk
120.500.12860/381872021-11-02T16:05:07Z

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