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A Laboratory Light Source for Ultrafast Kinetics of EUV Exposure Processes and Ultra-Small Pitch Lithography

dc.contributor.authorCousin, Seth L.
dc.contributor.authorBargsten, Clayton
dc.contributor.authorRinard, Eric
dc.contributor.authorWard, Rod
dc.contributor.authorHosler, Erik
dc.contributor.authorPetersen, Brennan
dc.contributor.authorKapteyn, Henity
dc.contributor.authorVanelderen, Pieter
dc.contributor.authorPetersen, John
dc.contributor.authorvan der Heide, Paul
dc.date.accessioned2022-01-25T09:23:13Z
dc.date.available2021-11-02T16:05:07Z
dc.date.available2022-01-25T09:23:13Z
dc.date.issued2020
dc.identifier.issn2160-9020
dc.identifier.otherWOS:000612090002193
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/38187.2
dc.sourceWOS
dc.titleA Laboratory Light Source for Ultrafast Kinetics of EUV Exposure Processes and Ultra-Small Pitch Lithography
dc.typeProceedings paper
dc.contributor.imecauthorVanelderen, Pieter
dc.contributor.imecauthorPetersen, John
dc.contributor.imecauthorvan der Heide, Paul
dc.contributor.orcidimecvan der Heide, Paul::0000-0001-6292-0329
dc.identifier.eisbn978-1-943580-76-7
dc.source.numberofpages2
dc.source.peerreviewyes
dc.source.conferenceConference on Lasers and Electro-Optics (CLEO)
dc.source.conferencedateMAY 10-15, 2020
dc.source.conferencelocationSan Jose
dc.source.journalna
imec.availabilityPublished - imec


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220.500.12860/38187.2*2022-01-25T09:22:37Zvalidation by library/open access desk
120.500.12860/381872021-11-02T16:05:07Z

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