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EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity

dc.contributor.authorNagahara, S.
dc.contributor.authorDinh, C.Q.
dc.contributor.authorYoshida, Keisuke
dc.contributor.authorShiraishi, G.
dc.contributor.authorKondo, Y.
dc.contributor.authorYoshihara, K.
dc.contributor.authorNafus, Kathleen
dc.contributor.authorPetersen, John
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorFoubert, Philippe
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorStock, H.
dc.contributor.authorMeliorisz, B.
dc.date.accessioned2021-10-29T01:14:43Z
dc.date.available2021-10-29T01:14:43Z
dc.date.issued2020
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/35635
dc.sourceIIOimport
dc.titleEUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity
dc.typeProceedings paper
dc.contributor.imecauthorYoshida, Keisuke
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorPetersen, John
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.identifier.doi10.1117/12.2552166
dc.source.peerreviewyes
dc.source.beginpage113260A
dc.source.conferenceAdvances in Patterning Materials and Processes XXXVII
dc.source.conferencedate24/02/2020
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 11326


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