Browsing by author "Kondo, Y."

Now showing items 1-1 of 1

EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity

Nagahara, S.; Dinh, C.Q.; Yoshida, Keisuke; Shiraishi, G.; Kondo, Y.; Yoshihara, K.; Nafus, Kathleen; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert; Stock, H.; Meliorisz, B. (2020)