Browsing by author "Foubert, Philippe"
Now showing items 1-20 of 66
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28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV Lithography
Kim, Il Hwan; Kim, Insung; Park, Changmin; Lee, Jsiun; Ryu, Koungmin; De Schepper, P.; Doise, J.; Kocsis, M.; De Simone, Danilo; Kljucar, Luka; Das, Poulomi; Blanc, Romuald; Beral, Christophe; Severi, Joren; Vandenbroeck, Nadia; Foubert, Philippe; Charley, Anne-Laure; Oak, Apoorva; Xu, Dongbo; Gillijns, Werner; Mitard, Jerome; Tokei, Zsolt; van der Veen, Marleen; Heylen, Nancy; Teugels, Lieve; Le, Quoc Toan; Schleicher, Filip; Leray, Philippe; Ronse, Kurt (2021) -
A CDU comparison of double-patterning process options using Monte Carlo simulation
Hooge, Joshua; Hatakeyama, Shinichi; Nafus, Kathleen; Scheer, Steven; Foubert, Philippe; Cheng, Shaunee; Leray, Philippe (2009) -
Analysis of the effect of point-of-use filtration on microbridging defectivity
Braggin, Jennifer; Gronheid, Roel; Cheng, Shaunee; Van Den Heuvel, Dieter; Bernard, Sophie; Foubert, Philippe; Rosslee, Craig (2009) -
Approaches to Enable Patterning of Tight Pitches towards High NA EUV
Tadatomo, Hiroki; Dauendorffer, Arnaud; Onitsuka, Tomoya; Genjima, Hisashi; Ido, Yasuyuki; Okada, Soichiro; Kuwahara, Yuhei; Hara, Arisa; Dinh, Congque; Fujimoto, Seiji; Kawakami, Shinichiro; Muramatsu, Makoto; Shimura, Satoru; Nafus, Kathleen; Oikawa, Noriaki; Ono, Kenta; Feurprier, Yannick; Demand, Marc; Negreira, Ainhoa Romo; Nagahara, Seiji; Blanco, Victor; Foubert, Philippe; De Simone, Danilo (2022) -
Assessment of EUV resist performance for sub-22nm hp lines and 26nm hp contacts on NXE3100
Goethals, Mieke; Van Roey, Frieda; Hosokawa, Kohei; Hoefnagels, Rik; Niroomand, Ardavan; Foubert, Philippe (2012) -
BARC process optimatization for hyper NA tools and influence of polarization on CD swing and standing waves
Op de Beeck, Maaike; Hermans, Jan; Foubert, Philippe; Wiaux, Vincent; Hendrickx, Eric (2005) -
Calibrated PSCAR stochastic simulation
Dinh, Cong Que; Nagahara, Seji; Shiraishi, Gousuke; Minekawa, Yukie; Kamei, Yuya; Carcasi, Michael; Ide, Hiroyuki; Kondo, Yoshihiro; Yoshida, Yuichi; Yoshihara, Kosuke; Shimada, Ryo; Tomono, Masaru; Moriya, Teruhiko; Takeshita, Kazuhiro; Nafus, Kathleen; Biesemans, Serge; Petersen, John; De Simone, Danilo; Foubert, Philippe; De Bisschop, Peter; Vandenberghe, Geert; Stock, Hans-Jurgen; Meliorisz, Balint (2019) -
Continued Optimization of Point-Of-Use Filtration for Metal Oxide Photoresists to Reduce Defect Density
Kohyama, T.; Chang, Shu-Hao; Doise, Jan; Kocsis, Michael; De Schepper, Peter; Foubert, Philippe (2023) -
Continuous improvements of defectivity rates in immersion photolithography via functionalized membranes in point-of-use photochemical filtration
D'Urzo, Lucia; Bayana, Hareen; Vandereyken, Jelle; Foubert, Philippe; Wu, Aiwen; Jaber, Jad; Hamzik, James (2017) -
Current and future requirements for metrology and inspection for advanced patterning
Leray, Philippe; Wong, Patrick; Halder, Sandip; Foubert, Philippe (2016) -
Defectivity modulation in EUV resists through advanced filtration technologies
D'Urzo, Lucia; Umeda, T.; Mizuno, T.; Hattori, A.; Varanasi, R.; Singh, A.; Beera, R.; Foubert, Philippe; Vandereyken, Jelle; Drent, Waut (2020) -
Defectivity study on dry development rinse process (DDRP)
Stokes, Harold; De Simone, Danilo; Thouroude, Yan; D'Urzo, Lucia; Sayan, Safak; Foubert, Philippe (2015) -
Effect of water on resist performance beyond resolution enhancement in 193nm immersion lithography
Kim, Hyun-Woo; Delvaux, Christie; Baerts, Christina; Gronheid, Roel; Foubert, Philippe; Kishimura, Shinji; Ercken, Monique (2005) -
EUV baseline process optimizations for NXE:3100 evaluation
Foubert, Philippe; Shite, Hideo; Nafus, Kathleen; Hermans, Jan; Hendrickx, Eric (2011) -
EUV lithographic process enablement with novel litho track hardware
Santos, Andreia; Kosma, Vasiliki; Vandereyken, Jelle; Marhfour, H.; Tanaka, Y.; Harumoto, M.; Asai, M.; Stokes, H.; Suh, Hyo Seon; Foubert, Philippe; De Simone, Danilo (2021) -
EUV Lithography in pre-production mode
Hendrickx, Eric; Hermans, Jan; Lorusso, Gian; Foubert, Philippe; Pollentier, Ivan; Goethals, Mieke; Jonckheere, Rik; Vandenberghe, Geert; Ronse, Kurt (2012) -
EUV Lithography in pre-production mode
Hendrickx, Eric; Hermans, Jan; Jonckheere, Rik; Van Den Heuvel, Dieter; Lorusso, Gian; Foubert, Philippe; De Bisschop, Peter; Vandenberghe, Geert; Ronse, Kurt (2012) -
EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing
Dinh, Cong Que; Nagahara, Seiji; Kuwahara, Yuhei; Dauendorffer, Arnaud; Yoshida, Keisuke; Okada, Soichiro; Onitsuka, Tomoya; Kawakami, Shinichiro; Shimura, Satoru; Muramatsu, Makoto; Yoshihara, Kosuke; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert; Huli, Lior; Grzeskowiak, Steven; Krawicz, Alexandra; Bae, Nayoung; Kato, Kanzo; Nafus, Kathleen; Raley, Angelique (2022) -
EUV patterning improvement toward high-volume manufacturing
Kuwahara, Yuhei; Matsunaga, Koichi; Kawakami, Shinichiro; Nafus, Kathleen; Foubert, Philippe; Goethals, Mieke (2015) -
EUV process establishment through litho and etch for N7 node
Kuwahara, Yuhei; Kawakami, Shinichiro; Kubota, Minoru; Matsunaga, Koichi; Nafus, Kathleen; Foubert, Philippe; Mao, Ming (2016)