Browsing by author "Foubert, Philippe"
Now showing items 21-40 of 66
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EUV process sensitivities and optimizations for track processing
Shite, Hideo; Bradon, Neil; Nafus, Kathleen; Kitano, Junichi; Kosugi, Hitoshi; Hermans, Jan; Hendrickx, Eric; Foubert, Philippe; Gronheid, Roel; Jehoul, Christiane; Van Den Heuvel, Dieter; Goethals, Mieke; Cheng, Shaunee (2010) -
EUV processing investigation on state-of-the-art coater/developer system
Shite, Hideo; Bradon, Neil; Shimoaoki, T.; Kobayashi, S.; Nafus, Kathleen; Kosugi, Hitoshi; Foubert, Philippe; Hermans, Jan; Hendrickx, Eric; Goethals, Mieke; Gronheid, Roel; Jehoul, Christiane (2011) -
EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity
Nagahara, S.; Dinh, C.Q.; Yoshida, Keisuke; Shiraishi, G.; Kondo, Y.; Yoshihara, K.; Nafus, Kathleen; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert; Stock, H.; Meliorisz, B. (2020) -
EUV resist performance enhancement by UV flood exposure for high NA EUV lithography
Cong Que Dinh; Nagahara, Seiji; Yoshida, Keisuke; Kondo, Yoshihiro; Muramatsu, Makoto; Yoshihara, Kosuke; Shimada, Ryo; Moriya, Teruhiko; Nafus, Kathleen; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert (2021) -
EUV resist process performance investigations on the NXE 3100 full field scanner
Goethals, Mieke; Foubert, Philippe; Hosokawa, Kohei; Van Roey, Frieda; Niroomand, Ardavan; Van Den Heuvel, Dieter; Pollentier, Ivan (2012) -
EUV reticle print verification with advanced broadband optical wafer inspection and e-beam review systems
De Simone, Danilo; Sanapala, Ravikumar; Andrrew, Cross; Preil, Moshe; Qian, Jin; Sumar, Shishir; Anantha, Vidyasagar; Sah, Kaushik; Eitapence, Scott; Van Den Heuvel, Dieter; Foubert, Philippe (2017) -
Exploring the readiness of EUV photo materials for patterning
De Simone, Danilo; Vesters, Yannick; Shehzad, Atif; Vandenberghe, Geert; Foubert, Philippe; Beral, Christophe; Van Den Heuvel, Dieter; Mao, Ming; Lazzarino, Frederic (2017) -
From ASML Alpha-demo tool to ASML NXE:3100 at imec - EUV lithography heading towards pre-production mode
Hendrickx, Eric; Hermans, Jan; Lorusso, Gian; Philipsen, Vicky; Foubert, Philippe; Pollentier, Ivan; Goethals, Mieke; Jonckheere, Rik; Vandenberghe, Geert; Ronse, Kurt (2011) -
High performance filtration for bulk materials: a novel HDPE membrane filter designed for EUV Lithography
D'Urzo, Lucia; Umeda, Toru; Mizuno, Takehito; Hattori, Atsushi; Singh, Amarnauth; Beera, Rajan; Foubert, Philippe; Drent, Waut (2021) -
High volume manufacturing compatible dry development rinse process (DDRP): patterning and defectivity performance for EUVL
Sayan, Safak; Vanelderen, Pieter; Hetel, Iulian; Chan, BT; Raghavan, Praveen; Blanco, Victor; Foubert, Philippe; D'Urzo, Lucia; De Simone, Danilo; Vandenberghe, Geert (2017) -
Image contrast contributions to immersion lithography defect formation and process yield
Rathsack, Ben; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Hatakeyama, Shinichi; Kouichi, Hontake; Kitano, Junichi; Van Den Heuvel, Dieter; Leray, Philippe; Hendrickx, Eric; Foubert, Philippe; Gronheid, Roel (2008) -
Imec's defect reduction strategies for EUV single exposed 32nm pitch line and space patterns
Foubert, Philippe; De Bisschop, Peter; Bekaert, Joost; Beral, Christophe; Rincon Delgadillo, Paulina (2019) -
Impact of post-litho linewidth roughness smoothing processes on the post-etch patterning result
Foubert, Philippe; Vaglio Pret, Alessandro; Altamirano Sanchez, Efrain; Gronheid, Roel (2011-07) -
Impact of post-litho LWR smoothing processes on the post-etch patterning result
Foubert, Philippe; Vaglio Pret, Alessandro; Altamirano Sanchez, Efrain; Gronheid, Roel (2011) -
Improving EUV underlayer coating defectivity using point-of-use filtration
Wu, Aiwen; Bayana, Hareen; Foubert, Philippe; Chacko, Andrea; Guerrero, Douglas (2020) -
Latest cluster performance for EUV lithography
Shite, Hideo; Matsunaga, Koichi; Nafus, Kathleen; Kosugi, H.; Foubert, Philippe; Hermans, Jan; Hendrickx, Eric; Goethals, Mieke; Van Den Heuvel, Dieter (2012) -
Manufacturability improvements in EUV resist processing towards NXE:3300 processing
Kuwahara, Yuhei; Matsunaga, Koichi; Shimoaoki, Takeshi; Kawakami, Shinichiro; Nafus, Kathleen; Foubert, Philippe; Goethals, Mieke; Shimura, Satoru (2014) -
Mask-induced polarization effects at high NA
Estroff, Andrew; Fan, Yongfa; Bourov, Anatoly; Smith, Bruce; Foubert, Philippe; Leunissen, Peter; Philipsen, Vicky; Aksenov, Yuri (2005-03) -
Measurement and evaluation of water uptake by resists, top coats and stacks and correlation with watermark defects
Foubert, Philippe; Kocsis, Michael; Gronheid, Roel; Kishimura, Shinji; Soyano, Akimasa; Nafus, Kathleen; Stepanenko, Nickolay; De Backer, Johan; Vandenbroeck, Nadia; Ercken, Monique (2007) -
Novel processing technologies for advanced EUV patterning materials using metal oxide resist (MOR)
Onitsuka, Tomoya; Kawakami, Shinichiro; Dauendorffer, Arnaud; Shimura, Satoru; Nafus, Kathleen; Feurprier, Yannick; Foubert, Philippe; De Simone, Danilo (2021)