EUV resist process performance investigations on the NXE 3100 full field scanner

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Authors

Goethals, Mieke; Foubert, Philippe; Hosokawa, Kohei; Van Roey, Frieda; Niroomand, Ardavan; Van Den Heuvel, Dieter; Pollentier, Ivan

ISSN

0914-9244

Issue

5

Journal

Journal of Photopolymer Science and Technology

Volume

25

Title

EUV resist process performance investigations on the NXE 3100 full field scanner

Publication type

Journal article

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