Authors

Foubert, Philippe; De Bisschop, Peter; Bekaert, Joost; Beral, Christophe; Rincon Delgadillo, Paulina

DOI

10.1117/12.2539592

Conference

International Conference on Extreme Ultraviolet Lithography 2019

Title

Imec's defect reduction strategies for EUV single exposed 32nm pitch line and space patterns

Publication type

Proceedings paper