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imec Publications
Conference contributions
Imec's defect reduction strategies for EUV single exposed 32nm pitch line and space patterns
Publication:
Imec's defect reduction strategies for EUV single exposed 32nm pitch line and space patterns
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Date
2019
Proceedings Paper
https://doi.org/10.1117/12.2539592
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Foubert, Philippe
;
De Bisschop, Peter
;
Bekaert, Joost
;
Beral, Christophe
;
Rincon Delgadillo, Paulina
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1977
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Acq. date: 2026-01-12
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1977
since deposited on 2021-10-27
1
last month
Acq. date: 2026-01-12
Citations