Publication:

Imec's defect reduction strategies for EUV single exposed 32nm pitch line and space patterns

Date

2019

Proceedings Paper

https://doi.org/10.1117/12.2539592

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Author(s)

Foubert, Philippe

;

De Bisschop, Peter

;

;

Beral, Christophe

;

Rincon Delgadillo, Paulina

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Acq. date: 2026-07-18