Browsing by author "Foubert, Philippe"
Now showing items 41-60 of 66
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Novel technologies in coater/developer to enhance the CD stability and to improve the defectivity toward N7 and smaller nodes
Kamei, Yuya; Sano, Yohei; Yamauchi, Takashi; Kawakami, Shinichiro; Tadokoro, Masahide; Enomoto, Masashi; Muramatsu, Makoto; Nafus, Kathleen; Sonoda, Akihiro; Demand, Marc; Foubert, Philippe (2019) -
Optical absorption and characteristics of low-k films and barrier layers in the UV range
Eslava Fernandez, Salvador; Eymery, Guillaume; Foubert, Philippe; Iacopi, Francesca; Maex, Karen; Baklanov, Mikhaïl (2007) -
Optical characteristics of low-k films and barrier layers in the ultra-violet range
Eslava Fernandez, Salvador; Baklanov, Mikhaïl; Foubert, Philippe; Eymery, Guillaume; Maex, Karen (2007) -
Patterning developments in spin-on hard mask systems for 30nm half pitch EUV technology
Truffert, Vincent; Pollentier, Ivan; Foubert, Philippe; Lazzarino, Frederic; Wilson, Chris; Ercken, Monique; Gronheid, Roel; Demuynck, Steven; Buch, Xavier; Anno, Yusuke (2012) -
Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher decomposition by flood exposure
Nagahara, Seiji; Carcasi, Michael; Shiraishi, Gosuke; Nakagawa, Hisashi; Dei, Satoshi; Shiozawa, Takahiro; Nafus, Kathleen; De Simone, Danilo; Vandenberghe, Geert; Stock, Hans-Jürgen; Küchler, Bernd; Hori, Masafumi; Naruoka, Takehiko; Nagai, Tomoki; Minekawa, Yukie; Iseki, Tomohiri; Kondo, Yoshihiro; Yoshihara, Kosuke; Kamei, Yuya; Tomono, Masaru; Shimada, Ryo; Biesemans, Serge; Nakashima, Hideo; Foubert, Philippe; Buitrago, Elizabeth; Vockenhuber, Michaela; Ekinci, Yasin; Oshima, Akihiro; Tagawa, Seiichi (2017) -
Point-of-use filtration strategy for negative tone developer in extended immersion and extreme-ultraviolet (EUV) lithography
D'Urzo, Lucia; Foubert, Philippe; Stokes, Harold; Thouroude, Yan; Xia, A.; Wu, A. (2015) -
Probabilistic Process Window: A new approach to focus-exposure analysis
Mack, Chris A.; Yannuzzi, Jonathan; Lorusso, Gian; Zidan, Mohamed; De Simone, Danilo; Weldeslassie, Ataklti; Vandenbroeck, Nadia; Foubert, Philippe; Beral, Christophe; Charley, Anne-Laure (2022) -
Probabilistic process window: a new approach to focus-exposure analysis
Mack, Chris A.; Yannuzzi, Jonathan; Lorusso, Gian; Zidan, Mohamed; De Simone, Danilo; Weldeslassie, Ataklti; Vandenbroeck, Nadia; Foubert, Philippe; Beral, Christophe; Charley, Anne-Laure (2023) -
Process evaluation and optimization for EUV manufacturing
Foubert, Philippe; Nafus, Kathleen; Shite, Hideo; Goethals, Mieke; Matsunaga, Koichi; Hermans, Jan; Hendrickx, Eric (2012) -
Process window discovery methodology development for advanced lithography
Van Den Heuvel, Dieter; Foubert, Philippe; Baudemprez, Bart; Lee, Angelica; Cross, Andrew; Sao, Kaushik; Haque, Naoshin; Parisi, Paolo; Baris, Oksin (2016) -
Process window discovery, expansion and control of design hotspots susceptible to overlay failures
Sah, Kaushik; Cross, Andrew; Mani, Antonio; Van Den Heuvel, Dieter; Foubert, Philippe (2017) -
Progress in EUV Lithography towards manufacturing from an exposure tool perspective
Hermans, Jan; Laidler, David; Foubert, Philippe; D'have, Koen; Cheng, Shaunee; Hendrickx, Eric; Dusa, Mircea (2012) -
Progresses and challenges of EUV lithography materials
De Simone, Danilo; Goethals, Mieke; Van Roey, Frieda; Tao, Zheng; Foubert, Philippe; Hendrickx, Eric; Vandenberghe, Geert; Ronse, Kurt (2014) -
Readiness of EUV lithography for insertion into manufacturing: The imec NXE:3100 program
Gronheid, Roel; Hendrickx, Eric; Hermans, Jan; Lorusso, Gian; Foubert, Philippe; Pollentier, Ivan; Goethals, Mieke; Jonckheere, Rik; Vandenberghe, Geert; Ronse, Kurt (2012) -
Readiness of EUV lithography for insertion into manufacturing: The IMEC NXE:3100 program
Hendrickx, Eric; Gronheid, Roel; Hermans, Jan; Lorusso, Gian; Foubert, Philippe; Pollentier, Ivan; Goethals, Mieke; Jonckheere, Rik; Vandenberghe, Geert; Ronse, Kurt (2013) -
Recent advances in EUV patterning in preparation towards high-NA EUV
Nagahara, Seiji; Dauendorffer, Arnaud; Thiam, Arame; Liu, Xiang; Kuwahara, Yuhei; Dinh, Cong Que; Okada, Soichiro; Kawakami, Shinichiro; Genjima, Hisashi; Nagamine, Noriaki; Muramatsu, Makoto; Shimura, Satoru; Tsuboi, Atsushi; Nafus, Kathleen; Feurprier, Yannick; Demand, Marc; Ramaneti, Rajesh; Foubert, Philippe; De Simone, Danilo; Vandenberghe, Geert (2023) -
Resist coating and developing process technology toward EUV manufacturing sub 7nm node
Kamei, Yuya; Shiozawa, Takahiro; Kawakami, Shinichiro; Shite, Hideo; Ichinomiya, Hiroshi; Hashimoto, Yusaku; Enomoto, Masashi; Nafus, Kathleen; Sonoda, Akihiko; Demand, Marc; Foubert, Philippe (2018) -
Resist profile control in immersion lithography using scatterometry measurements
Pollentier, Ivan; Ercken, Monique; Foubert, Philippe; Cheng, Shaunee (2005) -
Roughness characterization in the frequency domain and linewidth roughness mitigation with post-lithography processes
Vaglio Pret, Alessandro; Gronheid, Roel; Foubert, Philippe (2010-12) -
Roughness characterization in the frequency domain and LWR mitigation with post-litho processes
Vaglio Pret, Alessandro; Gronheid, Roel; Foubert, Philippe (2010)