Readiness of EUV lithography for insertion into manufacturing: The imec NXE:3100 program

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Authors
Gronheid, Roel; Hendrickx, Eric; Hermans, Jan; Lorusso, Gian; Foubert, Philippe; Pollentier, Ivan; Goethals, Mieke; Jonckheere, Rik; Vandenberghe, Geert; Ronse, Kurt
Conference
SEMICON Europa
Title
Readiness of EUV lithography for insertion into manufacturing: The imec NXE:3100 program
Publication type
Oral presentation
Embargo date
9999-12-31
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