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Readiness of EUV lithography for insertion into manufacturing: The imec NXE:3100 program
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Readiness of EUV lithography for insertion into manufacturing: The imec NXE:3100 program
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Date
2012
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26245.pdf
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Gronheid, Roel
;
Hendrickx, Eric
;
Hermans, Jan
;
Lorusso, Gian
;
Foubert, Philippe
;
Pollentier, Ivan
;
Goethals, Mieke
;
Jonckheere, Rik
;
Vandenberghe, Geert
;
Ronse, Kurt
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1853
since deposited on 2021-10-20
1
last month
Acq. date: 2025-12-16
Citations