Publication:

Readiness of EUV lithography for insertion into manufacturing: The imec NXE:3100 program

Date

2012
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dc.contributor.authorGronheid, Roel
dc.contributor.authorHendrickx, Eric
dc.contributor.authorHermans, Jan
dc.contributor.authorLorusso, Gian
dc.contributor.authorFoubert, Philippe
dc.contributor.authorPollentier, Ivan
dc.contributor.authorGoethals, Mieke
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorRonse, Kurt
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-20T11:20:38Z
dc.date.available2021-10-20T11:20:38Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20754
dc.source.conferenceSEMICON Europa
dc.source.conferencedate9/10/2012
dc.source.conferencelocationDresden Germany
dc.title

Readiness of EUV lithography for insertion into manufacturing: The imec NXE:3100 program

dc.typeOral presentation
dspace.entity.typePublication
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