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Probabilistic process window: a new approach to focus-exposure analysis
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Authors
Mack, Chris A.
;
Yannuzzi, Jonathan
;
Lorusso, Gian
;
Zidan, Mohamed
;
De Simone, Danilo
;
Weldeslassie, Ataklti
;
Vandenbroeck, Nadia
;
Foubert, Philippe
;
Beral, Christophe
;
Charley, Anne-Laure
DOI
10.1117/1.JMM.22.2.021007
ISSN
1932-5150
Issue
2
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
Volume
22
Title
Probabilistic process window: a new approach to focus-exposure analysis
Publication type
Journal article
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2
20.500.12860/43369.2
*
2024-03-11T15:54:32Z
validation by library/open access desk
1
20.500.12860/43369
2024-01-09T17:15:04Z
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