Browsing by author "Charley, Anne-Laure"

21 nm Pitch dual-damascene BEOL process integration with full barrierless Ru metallization

Vega Gonzalez, Victor; Wilson, Chris; Paolillo, Sara; Decoster, Stefan; Mao, Ming; Versluijs, Janko; Blanco, Victor; Kesters, Els; Le, Quoc Toan; Lorant, Christophe; Varela Pedreira, Olalla; Lesniewska, Alicja; Heylen, Nancy; El-Mekki, Zaid; van der Veen, Marleen; Webers, Tomas; Vats, Hemant; Rynders, Luc; Cupak, Miroslav; Lee, Jae Uk; Drissi, Youssef; Halipre, Luc; Charley, Anne-Laure; Verdonck, Patrick; Witters, Thomas; Van Gompel, Sander; Kimura, Yosuke; Jourdan, Nicolas; Ciofi, Ivan; Contino, Antonino; Boccardi, Guillaume; Lariviere, Stephane; De Wachter, Bart; Vancoille, Eric; Lazzarino, Frederic; Ercken, Monique; Kim, Ryan Ryoung han; Trivkovic, Darko; Croes, Kristof; Leray, Philippe; Pardons, Katrien; Barla, Kathy; Tokei, Zsolt (2019)

28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV Lithography

Kim, Il Hwan; Kim, Insung; Park, Changmin; Lee, Jsiun; Ryu, Koungmin; De Schepper, P.; Doise, J.; Kocsis, M.; De Simone, Danilo; Kljucar, Luka; Das, Poulomi; Blanc, Romuald; Beral, Christophe; Severi, Joren; Vandenbroeck, Nadia; Foubert, Philippe; Charley, Anne-Laure; Oak, Apoorva; Xu, Dongbo; Gillijns, Werner; Mitard, Jerome; Tokei, Zsolt; van der Veen, Marleen; Heylen, Nancy; Teugels, Lieve; Le, Quoc Toan; Schleicher, Filip; Leray, Philippe; Ronse, Kurt (2021)

300mm in-line metrologies for the characterization of ultra-thin layer of 2D materials

Moussa, Alain; Bogdanowicz, Janusz; Groven, Benjamin; Morin, Pierre; Beggiato, Matteo; Saib, Mohamed; Santoro, G.; Abramovitz, Y.; Houchens, K.; Ben Nissim, S.; Meir, N.; Hung, J.; Urbanowicz, A.; Koret, R.; Turovets, I.; Lorusso, Gian; Charley, Anne-Laure (2023)

3D features measurement using YieldStar, an angle resolved polarized scatterometer

Charley, Anne-Laure; Leray, Philippe; D'have, Koen; Cheng, Shaunee; Hinnen, Paul; Li, Fahong; Vanoppen, Peter; Dusa, Mircea (2011)

3D features measurement using Yieldstar, an angle resolved polarized scatterometer

Charley, Anne-Laure; Leray, Philippe; D'have, Koen; Cheng, Shaunee; Hinnen, P.; Li, Fahong; Vanoppen, Peter; Dusa, Mircea (2011)

A single metrology tool solution for complete exposure tool setup

Laidler, David; D'have, Koen; Charley, Anne-Laure; Leray, Philippe; Cheng, Shaunee; Dusa, Mircea; Vanoppen, Peter; Hinnen, Paul (2010)

Advanced CD-SEM imaging methodology for EPE measurements

Takemasa, Y.; Ohashi, T.; Shindo, H.; Lorusso, Gian; Charley, Anne-Laure (2018)

Advanced CD-SEM solution for edge placement error characterization of BEOL pitch 32nm metal layer

Charley, Anne-Laure; Leray, Philippe; Lorusso, Gian; Sutani, T.; Takemasa, Y. (2018)

Advanced characterization of 2D materials using SEM image processing and machine learning

Saib, Mohamed; Moussa, Alain; Beggiato, Matteo; Groven, Benjamin; Medina Silva, Henry; Morin, Pierre; Bogdanowicz, Janusz; Kar, Gouri Sankar; Charley, Anne-Laure (2024)

Characterization of Sub-micron Metal Line Arrays Using Picosecond Ultrasonics

Mebendale, M.; Kotelyanskii, M.; Mair, R.; Mukundhan, P.; Bogdanowicz, Janusz; Teugels, Lieve; Charley, Anne-Laure; Kuszewski, Piotr (2020)

Critical dimension metrology using Raman spectroscopy

Gawlik, Andrzej; Bogdanowicz, Janusz; Nuytten, Thomas; Charley, Anne-Laure; Teugels, Lieve; Misiewicz, Jan; Vandervorst, Wilfried (2020)

Cu Pad Surface Height Evaluation Technique by In-line SEM for Wafer Hybrid Bonding

Kasai, Hiroaki; Osaki, Mayuka; Hasumi, Kazuhisa; Mise, Nobuyuki; Tanaka, Maki; Tunca Altintas, Bensu; Chew, Soon Aik; Bogdanowicz, Janusz; Moussa, Alain; Saib, Mohamed; Zhang, Boyao; Charley, Anne-Laure (2024)

Detection of bonding voids for 3D integration

Chen, Cong; Van den Heuvel, Dieter; Beggiato, Matteo; Tunca Altintas, Bensu; Moussa, Alain; Vandooren, Anne; Baudemprez, Bart; Schobitz, Michael; Khaldi, Wassim; Bogdanowicz, Janusz; Beral, Christophe; Charley, Anne-Laure (2023)

Dry Resist Metrology Readiness for High-NA EUVL

Lorusso, Gian; Van den Heuvel, Dieter; Zidan, Mohamed; Moussa, Alain; Beral, Christophe; Charley, Anne-Laure; De Simone, Danilo; De Silva, Anuja; Verveniotis, Elisseos; Haider, Ali; Kondo, Tsuyoshi; Shindo, Hiroyuki; Ebizuka, Yasushi; Isawa, Miki (2023)

e-beam metrology of thin resist for high NA EUVL

Lorusso, Gian; De Simone, Danilo; Zidan, Mohamed; Severi, Joren; Moussa, Alain; Dey, Bappaditya; Halder, Sandip; Goldenshtein, Alex; Houchens, Kevin; Santoro, Gaetano; Fischer, Daniel; Muellender, Angelika; Mack, Chris; Kondo, Tsuyoshi; Shohjoh, Tomoyasu; Ikota, Masami; Charley, Anne-Laure; De Gendt, Stefan; Leray, Philippe (2023)

Enabling CD SEM metrology for 5nm technology node and beyond

Lorusso, Gian; Ohashi, Takeyoshi; Yamaguchi, Astuko; Inoue, Osamu; Sutani, Takumichi; Horiguchi, Naoto; Boemmels, Juergen; Wilson, Chris; Briggs, Basoene; Tan, Chi Lim; Raymaekers, Tom; Delhougne, Romain; Van den Bosch, Geert; Di Piazza, Luca; Kar, Gouri Sankar; Furnemont, Arnaud; Fantini, Andrea; Donadio, Gabriele Luca; Souriau, Laurent; Crotti, Davide; Yasin, Farrukh; Appeltans, Raf; Rao, Siddharth; De Simone, Danilo; Rincon Delgadillo, Paulina; Leray, Philippe; Charley, Anne-Laure; Zhou, Daisy; Veloso, Anabela; Collaert, Nadine; Hasumi, Kazuhisa; Koshihara, Shunsuke; Ikota, Masami; Okagawa, Yutaka; Ishimoto, Toru (2017)

Extraction of Roughness Measurements from Thin Resists with Low Signal-to-Noise-Ratio (SNR) SEM Images by Applying Deep Learning Denoiser

Zidan, Mohamed; Dey, Bappaditya; De Simone, Danilo; Severi, Joren; Charley, Anne-Laure; Halder, Sandip; Leray, Philippe; De Gendt, Stefan; Lorusso, Gian (2022)