Browsing by author "Charley, Anne-Laure"
Now showing items 21-40 of 57
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High speed optical metrology solution for after etch process monitoring and control
Charley, Anne-Laure; Leray, Philippe; Pypen, Wouter; Cheng, Shaunee; Verma, Alok; Mattheus, Christine; Wisse, Baukje; Cramer, Hugo; Niesing, Henk; Kruijswijk, Stefan (2014) -
High-speed full 3D feature metrology for litho monitoring, matching and model calibration with scatterometry
Cramer, H.; Chen, An; Li, Frank; Leray, Philippe; Charley, Anne-Laure; Van Look, Lieve; Bekaert, Joost; Cheng, Shaunee (2012) -
Imaging of buried overlay and alignment markers using picosecond acoustic microscopy
Mehendale, Manjusha; Antonelli, Andy; Mair, Robin; Mukundhan, Priya; Bogdanowicz, Janusz; Blanco, Victor; Charley, Anne-Laure; Leray, Philippe (2022) -
IMAGING OF OVERLAY AND ALIGNMENT MARKERS UNDER OPAQUE LAYERS USING PICOSECOND LASER ACOUSTIC MEASUREMENTS AM: Advanced Metrology
Mehendale, M.; Antonelli, A.; Mair, R.; Mukundhan, P.; Bogdanowicz, Janusz; Charley, Anne-Laure; Leray, Philippe; Yasin, Farrukh; Crotti, Davide (2021) -
Influence of photoresist thinning and underlayer film on e-beam using eP5 for High-NA patterning
Hasan, Mahmudul; Beral, Christophe; Lorusso, Gian; De Simone, Danilo; Moussa, Alain; Van den Heuvel, Dieter; Charley, Anne-Laure; Leray, Philippe (2022) -
Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control
Gunay Demirkol, Anil; Altamirano Sanchez, Efrain; Héraud, Stéphane; Godny, Stephane; Charley, Anne-Laure; Leray, Philippe; Urenski, Ronen; Cohen, Oded; Turovets, Igor; Wolfling, Shay (2016) -
Inspection and metrology challenges for 3 nm node devices and beyond
Shohjoh, T.; Ikota, M.; Isawa, M.; Lorusso, Gian; Horiguchi, Naoto; Briggs, Basoene; Mertens, Hans; Bogdanowicz, Janusz; De Bisschop, Peter; Charley, Anne-Laure (2021) -
Line-end gap measurement with YieldStar scatterometer: towards an OPC model calibration
Charley, Anne-Laure; Leray, Philippe; Cheng, Shaunee; Dusa, Mircea; Chiou, T.-B.; Fumar-Pici, A. (2012) -
Localized power spectral density analysis on atomic force microscopy images for advanced patterning applications
Moussa, Alain; Saib, Mohamed; Paolillo, Sara; Lazzarino, Frederic; Illiberi, Andrea; Maes, Jan; Deng, Shaoren; Charley, Anne-Laure; Leray, Philippe (2019) -
Low-Voltage Aberration-Corrected SEM Metrology of Thin Resist for High-NA EUVL
Zidan, Mohamed; Fischer, Daniel; Lorusso, Gian; Severi, Joren; De Simone, Danilo; Moussa, Alain; Muellender, Angelika; Mack, Chris A.; Charley, Anne-Laure; Leray, Philippe; De Gendt, Stefan (2022) -
Massive metrology and inspection solution for EUV by area inspection SEM with machine learning technology
Kondo, Tsuyoshi; Ban, N.; Ebizuka, Y.; Toyoda, Y.; Yamada, Y.; Kashiwa, T.; Koike, H.; Shindo, H.; Charley, Anne-Laure; Saib, Mohamed; Van Roey, Frieda; De Bisschop, Peter; De Simone, Danilo; Beral, Christophe; Lorusso, Gian (2021) -
Metrology of Thin Resist for High NA EUVL
Lorusso, Gian; Beral, Christophe; Bogdanowicz, Janusz; De Simone, Danilo; Hasan, Mahmudul; Jehoul, Christiane; Moussa, Alain; Saib, Mohamed; Zidan, Mohamed; Severi, Joren; Truffert, Vincent; Van Den Heuvel, Dieter; Goldenshtein, Alex; Houchens, Kevin; Santoro, Gaetano; Fischer, Daniel; Muellender, Angelika; Hung, Joey; Koret, Roy; Turovets, Igor; Ausschnitte, Kit; Mack, Chris; Kondo, Tsuyoshi; Shohjoh, Tomoyasu; Ikota, Masami; Charley, Anne-Laure; Leray, Philippe (2022) -
Model-free measurement of lateral recess in gate-all-around transistors with micro hard-X-ray fluorescence
Bogdanowicz, Janusz; Oniki, Yusuke; Kenis, Karine; Puttarame Gowda, Pallavi; Mertens, Hans; Shamieh, Basel; Leon, Yonatan; Wormington, Matthew; Van der Meer, Juliette; Charley, Anne-Laure (2023) -
Modeling of tone inversion process flow for N5 interconnect to characterize block tip to tip
Guissi, Sofiane; Clark, William; Juncker, Aurélie; Ervin, J.; Greiner, K.; Fried, D.; Briggs, Basoene; Devriendt, Katia; Sebaai, Farid; Charley, Anne-Laure; Wilson, Chris; Boemmels, Juergen; Tokei, Zsolt (2017) -
Multivariate analysis methodology for the study of massive multidimensional SEM data
Saib, Mohamed; Lorusso, Gian; Charley, Anne-Laure; Leray, Philippe; Kondo, Tsuyoshi; Kawamoto, Yuta; Ebizuka, Yasushi; Ban, Naoma (2021) -
Need for LWR metrology standardization: the imec roughness protocol
Lorusso, Gian; Sutani, Takeyoshi; Rutigliani, Vito; Van Roey, Frieda; Moussa, Alan; Charley, Anne-Laure; Mack, Chris; Naulleau, Patrick; Perera, Chami; Constantoudis, Vassilios; Ikota, Masami; Ishimoto, Toru; Koshihara, Shunshuke (2018) -
Printability and propagation of stochastic defects through a study o defects programmed on EUV mask
Das, Poulomi; Moussa, Alain; Beral, Christophe; Gupta, Mihir; Saib, Mohamed; Halder, Sandip; Charley, Anne-Laure; Leray, Philippe (2021) -
Probabilistic Process Window: A new approach to focus-exposure analysis
Mack, Chris A.; Yannuzzi, Jonathan; Lorusso, Gian; Zidan, Mohamed; De Simone, Danilo; Weldeslassie, Ataklti; Vandenbroeck, Nadia; Foubert, Philippe; Beral, Christophe; Charley, Anne-Laure (2022) -
Probabilistic process window: a new approach to focus-exposure analysis
Mack, Chris A.; Yannuzzi, Jonathan; Lorusso, Gian; Zidan, Mohamed; De Simone, Danilo; Weldeslassie, Ataklti; Vandenbroeck, Nadia; Foubert, Philippe; Beral, Christophe; Charley, Anne-Laure (2023) -
Process Integration of High Aspect Ratio Vias with a Comparison between Co and Ru Metallizations
Vega Gonzalez, Victor; Montero Alvarez, Daniel; Versluijs, Janko; Varela Pedreira, Olalla; Jourdan, Nicolas; Puliyalil, Harinarayanan; Chehab, Bilal; Peissker, Tobias; Haider, Ali; Batuk, Dmitry; Martinez Alanis, Gerardo Tadeo; Geypen, Jef; Le, Quoc Toan; Bazzazian, Nina; Heylen, Nancy; van der Veen, Marleen; El-Mekki, Zaid; Webers, Tomas; Vats, H.; Rynders, Luc; Cupak, Miroslav; Lee, Jae Uk; Drissi, Youssef; Halipre, Luc; Gillijns, Werner; Charley, Anne-Laure; Verdonck, Patrick; Witters, Thomas; Van Gompel, Sander; Kimura, Yosuke; Ciofi, Ivan; De Wachter, Bart; Swerts, Johan; Grieten, Eva; Ercken, Monique; Kim, Ryan Ryoung han; Croes, Kristof; Leray, Philippe; Jaysankar, Manoj; Nagesh, Nishanth; Ramakers, Leon; Murdoch, Gayle; Park, Seongho; Tokei, Zsolt; Dentoni Litta, Eugenio; Horiguchi, Naoto (2021)