Browsing by author "Charley, Anne-Laure"
Now showing items 41-57 of 57
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Pushing the boundaries of EUV scatterometry: reconstruction of complex nanostructures for next-generation transistor technology
Ciesielski, Richard; Lohr, Leonhard M.; Mertens, Hans; Charley, Anne-Laure; de Ruyter, Rudi; Bogdanowicz, Janusz; Hoenicke, Philipp; Abbasirad, Najmeh; Soltwisch, Victor (2023) -
Recess metrology challenges for 3D device architectures in advanced technology nodes
Santoro, Gaetano; Houchens, Kevin; Bogdanowicz, Janusz; Elizov, Moshe; Yaron, Lior; Chemama, Michael; Goldenshtein, Alex; Zakay, Amit; Amit, Noam; Briggs, Basoene; Pacco, Antoine; Delhougne, Romain; Cockburn, Andrew; Abramovitz, Yaniv; Tam, Aviram; Adan, Ofer; Mertens, Hans; Charley, Anne-Laure; Horiguchi, Naoto; Leray, Philippe; Lorusso, Gian (2022) -
Regularized Autoencoder for The Analysis of Multivariate Metrology Data
Saib, Mohamed; Lorusso, Gian; Charley, Anne-Laure; Leray, Philippe; Kondo, Tsuyoshi; Shindo, Hiroyuki; Ebizuka, Yasushi; Ban, Naoma; Ikota, Masami (2022) -
Role of landing energy in e-beam metrology of thin photoresist for high-numerical aperture extreme ultraviolet lithography
Zidan, Mohamed; Fischer, Daniel; Severi, Joren; De Simone, Danilo; Moussa, Alain; Mullender, Angelika; Mack, Chris; Charley, Anne-Laure; Leray, Philippe; De Gendt, Stefan; Lorusso, Gian (2023) -
Scatterometry and AFM measurement combination for area selective deposition process characterization
Saib, Mohamed; Moussa, Alain; Charley, Anne-Laure; Leray, Philippe; Hung, Joey; Koret, Roy; Turovets, Igor; Ger, Avron; Deng, Shaoren; Illiberi, Andrea; Maes, Jan Willem; Woodworth, Gabriel; Strauss, Michael (2019) -
Scatterometry metrology validation with respect to process control
Leray, Philippe; Cheng, Shaunee; Laidler, David; D'have, Koen; Charley, Anne-Laure (2010) -
Scatterometry solutions for 14nm half-pitch BEOL layers patterned by EUV single exposure
Das, Sayantan; Hung, Joey; Halder, Sandip; Koret, Roy; Turovets, Igor; Charley, Anne-Laure; Leray, Philippe (2021) -
Selectivity process control using in-line XPS for self-assembly monolayer-based selective deposition process
Armini, Silvia; Herregods, Sebastiaan; Tokei, Zsolt; Charley, Anne-Laure; Leray, Philippe; Lee, Wei Ti; Larson, Tom; Figueiro, Nivea; Koret, Roy; Wolfling, Shay (2018) -
Small target compatible dimensional and analytical metrology for semiconductor nanostructures using X-ray fluorescence techniques
Hoenicke, Philipp; Kayser, Yves; Soltwisch, Victor; Waehlish, Andre; Wauschkuhn, Nils; Scheerder, Jeroen; Fleischmann, Claudia; Bogdanowicz, Janusz; Charley, Anne-Laure; Veloso, Anabela; Loo, Roger; Mertens, Hans; Hikavyy, Andriy; Siefke, Thomas; Andrle, Anna; Gwalt, Grzegorz; Siewert, Frank; Ciesielski, Richard; Beckhoff, Burkhard (2023) -
Spectroscopy: A new route towards critical-dimension metrology of the cavity etch of nanosheet transistors
Bogdanowicz, Janusz; Oniki, Yusuke; Kenis, Karine; Muraki, Yusuke; Nuytten, Thomas; Sergeant, Stefanie; Franquet, Alexis; Spampinato, Valentina; Conard, Thierry; Hoflijk, Ilse; Meersschaut, Johan; Claessens, Niels; Moussa, Alain; Van Den Heuvel, Dieter; Hung, Joey; Koret, Roy; Charley, Anne-Laure; Leray, Philippe (2021) -
Staggered pillar patterning using 0.33NA EUV lithography
De Simone, Danilo; Blanc, Romuald; Van de Kerkhove, Jeroen; Tamaddon, Amir-Hossein; Fallica, Roberto; Van Look, Lieve; Rassoul, Nouredine; Lazzarino, Frederic; Vandenbroeck, Nadia; Vanelderen, Pieter; Lorusso, Gian; Van Roey, Frieda; Charley, Anne-Laure; Vandenberghe, Geert; Ronse, Kurt; Lee, Kilyoung; Lee, Junghyung; Park, Sarohan; Lim, Chang-Moon; Park, Chan-Ha (2019) -
Subsurface Scanning Probe Metrology for Overlay through Opaque Layers
Battisti, I; Makles, K. M.; Mucientes, M. S. J.; Guo, Y.; Simons, E.; Bogdanowicz, Janusz; Moussa, Alain; Blanco, Victor; Yasin, Farrukh; Crotti, Davide; Charley, Anne-Laure; Leray, Philippe; van Reijzen, M. E.; Bozdog, C.; Sadeghian, H. (2022) -
Supervia Process Integration and Reliability Compared to Stacked Vias Using Barrierless Ruthenium
Vega Gonzalez, Victor; Puliyalil, Harinarayanan; Versluijs, Janko; Lesniewska, Alicja; Varela Pedreira, Olalla; Baert, Rogier; Paolillo, Sara; Decoster, Stefan; Schleicher, Filip; Montero Alvarez, Daniel; Bekaert, Joost; Kesters, Els; Le, Quoc Toan; Lorant, Christophe; Teugels, Lieve; Heylen, Nancy; Jourdan, Nicolas; El-Mekki, Zaid; van der Veen, Marleen; Ciofi, Ivan; Briggs, Basoene; Heijlen, Jeroen; Dupas, Luc; De Wachter, Bart; Vancoille, Eric; Webers, Tomas; Vats, Hemant; Rynders, Luc; Cupak, Miroslav; Lee, Jae Uk; Drissi, Youssef; Halipre, Luc; Charley, Anne-Laure; Verdonck, Patrick; Witters, Thomas; Van Gompel, Sander; Kimura, Yosuke; Demonie, Ingrid; Lazzarino, Frederic; Ercken, Monique; Kim, Ryan Ryoung han; Trivkovic, Darko; Croes, Kristof; Leray, Philippe; Jaysankar, Manoj; Wilson, Chris; Murdoch, Gayle; Tokei, Zsolt (2020) -
The application of a Rapid Probe Microscope (RPM) for investigating 1D and 2D structures from EUV lithography
Humphris, Andrew; Moussa, Alain; Dusa, Mircea; Charley, Anne-Laure; Newman, Ellis; Goulden, Jenny; Feng, Lei; Bevis, Christopher (2020) -
The need for LWR metrology standardization: the imec roughness protocol
Lorusso, Gian; Sutani, Takeyoshi; Rutigliani, Vito; Van Roey, Frieda; Moussa, Alain; Charley, Anne-Laure; Mack, Chris; Naulleau, Patrick; Constantoudis, Vassilios; Ikota, Masami; Ishimoto, Toru; Koshihara, S (2018) -
Three-layer BEOL process integration with supervia and self-aligned-block options for the 3nm node
Vega Gonzalez, Victor; Wilson, Chris; Briggs, Basoene; Decoster, Stefan; Versluijs, Janko; Lesniewska, Alicja; Paolillo, Sara; Baert, Rogier; Puliyalil, Harinarayanan; Bekaert, Joost; Kesters, Els; Le, Quoc Toan; Lorant, Christophe; Varela Pedreira, Olalla; Teugels, Lieve; Heylen, Nancy; El-Mekki, Zaid; van der Veen, Marleen; Webers, Tomas; Vats, Hemant; Rynders, Luc; Cupak, Miroslav; Lee, Jae Uk; Drissi, Youssef; Halipre, Luc; Charley, Anne-Laure; Verdonck, Patrick; Witters, Thomas; Van Gompel, Sander; Kimura, Yosuke; Jourdan, Nicolas; Ciofi, Ivan; Gupta, Anshul; Contino, Antonino; Boccardi, Guillaume; Lariviere, Stephane; Dupas, Luc; De Wachter, Bart; Vancoille, Eric; Lazzarino, Frederic; Ercken, Monique; Debacker, Peter; Kim, Ryan Ryoung han; Trivkovic, Darko; Croes, Kristof; Leray, Philippe; Dillemans, Leander; Chen, Yi-Fan; Tokei, Zsolt (2019) -
Use of scatterometry for NXE:3100 scanner monitoring
Charley, Anne-Laure (2012)