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Role of landing energy in e-beam metrology of thin photoresist for high-numerical aperture extreme ultraviolet lithography
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Authors
Zidan, Mohamed
;
Fischer, Daniel
;
Severi, Joren
;
De Simone, Danilo
;
Moussa, Alain
;
Mullender, Angelika
;
Mack, Chris
;
Charley, Anne-Laure
;
Leray, Philippe
;
De Gendt, Stefan
;
Lorusso, Gian
DOI
10.1117/1.JMM.22.2.021002
ISSN
1932-5150
Issue
2
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
Volume
22
Title
Role of landing energy in e-beam metrology of thin photoresist for high-numerical aperture extreme ultraviolet lithography
Publication type
Journal article
Embargo date
2023-06-10
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2
20.500.12860/43360.2
*
2024-01-22T15:26:03Z
validation by library/open access desk
1
20.500.12860/43360
2024-01-08T17:19:01Z
*Selected version
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