Browsing by author "Mack, Chris"

Characterizing variation in EUV contact hole lithography

Mack, Chris; Lorusso, Gian; De Simone, Danilo; Severi, Joren (2020)

Determining the ultimate resolution of scanning electron microscope unbiased roughness measurements, part 1: Simulating noise

Mack, Chris; Lorusso, Gian (2019)

Diagnosing and Removing CD-SEM Metrology Artifacts

Mack, Chris; Lorusso, Gian; Delvaux, Christie (2021)

e-beam metrology of thin resist for high NA EUVL

Lorusso, Gian; De Simone, Danilo; Zidan, Mohamed; Severi, Joren; Moussa, Alain; Dey, Bappaditya; Halder, Sandip; Goldenshtein, Alex; Houchens, Kevin; Santoro, Gaetano; Fischer, Daniel; Muellender, Angelika; Mack, Chris; Kondo, Tsuyoshi; Shohjoh, Tomoyasu; Ikota, Masami; Charley, Anne-Laure; De Gendt, Stefan; Leray, Philippe (2023)

Evolution of roughness during the pattern transfer of high-chi, 10 nm half-pitch, silicon-containing block copolymer structures

Blachut, Gregory; Sirard, Stephen; Liang, Andrew; Mack, Chris; Maher, Michael; Rincon Delgadillo, Paulina; Chan, BT; Mannaert, Geert; Vandenberghe, Geert; Willson, Grant; Ellison, Christopher; Hymes, Diane (2018)

Metrology of Thin Resist for High NA EUVL

Lorusso, Gian; Beral, Christophe; Bogdanowicz, Janusz; De Simone, Danilo; Hasan, Mahmudul; Jehoul, Christiane; Moussa, Alain; Saib, Mohamed; Zidan, Mohamed; Severi, Joren; Truffert, Vincent; Van Den Heuvel, Dieter; Goldenshtein, Alex; Houchens, Kevin; Santoro, Gaetano; Fischer, Daniel; Muellender, Angelika; Hung, Joey; Koret, Roy; Turovets, Igor; Ausschnitte, Kit; Mack, Chris; Kondo, Tsuyoshi; Shohjoh, Tomoyasu; Ikota, Masami; Charley, Anne-Laure; Leray, Philippe (2022)

Need for LWR metrology standardization: the imec roughness protocol

Lorusso, Gian; Sutani, Takeyoshi; Rutigliani, Vito; Van Roey, Frieda; Moussa, Alan; Charley, Anne-Laure; Mack, Chris; Naulleau, Patrick; Perera, Chami; Constantoudis, Vassilios; Ikota, Masami; Ishimoto, Toru; Koshihara, Shunshuke (2018)

Role of landing energy in e-beam metrology of thin photoresist for high-numerical aperture extreme ultraviolet lithography

Zidan, Mohamed; Fischer, Daniel; Severi, Joren; De Simone, Danilo; Moussa, Alain; Mullender, Angelika; Mack, Chris; Charley, Anne-Laure; Leray, Philippe; De Gendt, Stefan; Lorusso, Gian (2023)