The need for LWR metrology standardization: the imec roughness protocol

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Authors
Lorusso, Gian; Sutani, Takeyoshi; Rutigliani, Vito; Van Roey, Frieda; Moussa, Alain; Charley, Anne-Laure; Mack, Chris; Naulleau, Patrick; Constantoudis, Vassilios; Ikota, Masami; Ishimoto, Toru; Koshihara, S
Conference
Metrology, Inspection, and Process Control for Microlithography XXXII
Title
The need for LWR metrology standardization: the imec roughness protocol
Publication type
Proceedings paper
Embargo date
9999-12-31
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