Publication:
The need for LWR metrology standardization: the imec roughness protocol
Date
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0000-0003-3498-5082 | |
| cris.virtual.orcid | 0000-0002-6377-4199 | |
| cris.virtual.orcid | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0000-0003-4745-0167 | |
| cris.virtualsource.department | 0cddeaa4-4a9c-44ee-a5d6-ba4f3945e8a7 | |
| cris.virtualsource.department | fde8f386-0ddb-42e1-ad64-53cde7dda12d | |
| cris.virtualsource.department | afe860fb-17ef-4e14-b8be-130d9091bd88 | |
| cris.virtualsource.department | 264c186e-7bc4-4bed-8d4f-11fe1bff9e26 | |
| cris.virtualsource.orcid | 0cddeaa4-4a9c-44ee-a5d6-ba4f3945e8a7 | |
| cris.virtualsource.orcid | fde8f386-0ddb-42e1-ad64-53cde7dda12d | |
| cris.virtualsource.orcid | afe860fb-17ef-4e14-b8be-130d9091bd88 | |
| cris.virtualsource.orcid | 264c186e-7bc4-4bed-8d4f-11fe1bff9e26 | |
| dc.contributor.author | Lorusso, Gian | |
| dc.contributor.author | Sutani, Takeyoshi | |
| dc.contributor.author | Rutigliani, Vito | |
| dc.contributor.author | Van Roey, Frieda | |
| dc.contributor.author | Moussa, Alain | |
| dc.contributor.author | Charley, Anne-Laure | |
| dc.contributor.author | Mack, Chris | |
| dc.contributor.author | Naulleau, Patrick | |
| dc.contributor.author | Constantoudis, Vassilios | |
| dc.contributor.author | Ikota, Masami | |
| dc.contributor.author | Ishimoto, Toru | |
| dc.contributor.author | Koshihara, S | |
| dc.contributor.imecauthor | Lorusso, Gian | |
| dc.contributor.imecauthor | Van Roey, Frieda | |
| dc.contributor.imecauthor | Moussa, Alain | |
| dc.contributor.imecauthor | Charley, Anne-Laure | |
| dc.date.accessioned | 2021-10-25T22:34:01Z | |
| dc.date.available | 2021-10-25T22:34:01Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2018 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/31241 | |
| dc.identifier.url | https://doi.org/10.1117/12.2294617 | |
| dc.source.beginpage | 105850D | |
| dc.source.conference | Metrology, Inspection, and Process Control for Microlithography XXXII | |
| dc.source.conferencedate | 25/02/2018 | |
| dc.source.conferencelocation | San Jose, CA USA | |
| dc.title | The need for LWR metrology standardization: the imec roughness protocol | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | Original bundle
| |
| Publication available in collections: |