Publication:

The need for LWR metrology standardization: the imec roughness protocol

Date

2018
Proceedings Paper
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cris.virtual.orcid0000-0003-3498-5082
cris.virtual.orcid0000-0002-6377-4199
cris.virtual.orcid0000-0003-4745-0167
cris.virtualsource.department0cddeaa4-4a9c-44ee-a5d6-ba4f3945e8a7
cris.virtualsource.departmentfde8f386-0ddb-42e1-ad64-53cde7dda12d
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cris.virtualsource.orcid264c186e-7bc4-4bed-8d4f-11fe1bff9e26
dc.contributor.authorLorusso, Gian
dc.contributor.authorSutani, Takeyoshi
dc.contributor.authorRutigliani, Vito
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorMoussa, Alain
dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorMack, Chris
dc.contributor.authorNaulleau, Patrick
dc.contributor.authorConstantoudis, Vassilios
dc.contributor.authorIkota, Masami
dc.contributor.authorIshimoto, Toru
dc.contributor.authorKoshihara, S
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorCharley, Anne-Laure
dc.date.accessioned2021-10-25T22:34:01Z
dc.date.available2021-10-25T22:34:01Z
dc.date.embargo9999-12-31
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/31241
dc.identifier.urlhttps://doi.org/10.1117/12.2294617
dc.source.beginpage105850D
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXII
dc.source.conferencedate25/02/2018
dc.source.conferencelocationSan Jose, CA USA
dc.title

The need for LWR metrology standardization: the imec roughness protocol

dc.typeProceedings paper
dspace.entity.typePublication
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