Browsing by author "Severi, Joren"

28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV Lithography

Kim, Il Hwan; Kim, Insung; Park, Changmin; Lee, Jsiun; Ryu, Koungmin; De Schepper, P.; Doise, J.; Kocsis, M.; De Simone, Danilo; Kljucar, Luka; Das, Poulomi; Blanc, Romuald; Beral, Christophe; Severi, Joren; Vandenbroeck, Nadia; Foubert, Philippe; Charley, Anne-Laure; Oak, Apoorva; Xu, Dongbo; Gillijns, Werner; Mitard, Jerome; Tokei, Zsolt; van der Veen, Marleen; Heylen, Nancy; Teugels, Lieve; Le, Quoc Toan; Schleicher, Filip; Leray, Philippe; Ronse, Kurt (2021)

Characterizing variation in EUV contact hole lithography

Mack, Chris; Lorusso, Gian; De Simone, Danilo; Severi, Joren (2020)

Chemically amplified resist CDSEM metrology exploration for high NA EUV lithography

Severi, Joren; Lorusso, Gian F.; De Simone, Danilo; Moussa, Alain; Saib, Mohamed; Duflou, Rutger; De Gendt, Stefan (2022)

Dielectric Response Spectroscopy as Means to Investigate Interfacial Effects for Ultra-Thin Film Polymer-Based High NA EUV Lithography

Severi, Joren; De Simone, Danilo; De Gendt, Stefan (2020)

e-beam metrology of thin resist for high NA EUVL

Lorusso, Gian; De Simone, Danilo; Zidan, Mohamed; Severi, Joren; Moussa, Alain; Dey, Bappaditya; Halder, Sandip; Goldenshtein, Alex; Houchens, Kevin; Santoro, Gaetano; Fischer, Daniel; Muellender, Angelika; Mack, Chris; Kondo, Tsuyoshi; Shohjoh, Tomoyasu; Ikota, Masami; Charley, Anne-Laure; De Gendt, Stefan; Leray, Philippe (2023)

Extraction of Roughness Measurements from Thin Resists with Low Signal-to-Noise-Ratio (SNR) SEM Images by Applying Deep Learning Denoiser

Zidan, Mohamed; Dey, Bappaditya; De Simone, Danilo; Severi, Joren; Charley, Anne-Laure; Halder, Sandip; Leray, Philippe; De Gendt, Stefan; Lorusso, Gian (2022)

Low-Voltage Aberration-Corrected SEM Metrology of Thin Resist for High-NA EUVL

Zidan, Mohamed; Fischer, Daniel; Lorusso, Gian; Severi, Joren; De Simone, Danilo; Moussa, Alain; Muellender, Angelika; Mack, Chris A.; Charley, Anne-Laure; Leray, Philippe; De Gendt, Stefan (2022)

Measuring and Analyzing Contact Hole Variations in EUV Lithography

Severi, Joren; Mack, Chris A.; Lorusso, Gian; De Simone, Danilo (2021)

Metrology of Thin Resist for High NA EUVL

Lorusso, Gian; Beral, Christophe; Bogdanowicz, Janusz; De Simone, Danilo; Hasan, Mahmudul; Jehoul, Christiane; Moussa, Alain; Saib, Mohamed; Zidan, Mohamed; Severi, Joren; Truffert, Vincent; Van Den Heuvel, Dieter; Goldenshtein, Alex; Houchens, Kevin; Santoro, Gaetano; Fischer, Daniel; Muellender, Angelika; Hung, Joey; Koret, Roy; Turovets, Igor; Ausschnitte, Kit; Mack, Chris; Kondo, Tsuyoshi; Shohjoh, Tomoyasu; Ikota, Masami; Charley, Anne-Laure; Leray, Philippe (2022)

Molecular modeling of EUV photoresist revealing the effect of chain conformation on line edge roughness formation

Park, Juhae; Lee, Sung-Gyu; Vesters, Yannick; Severi, Joren; Myungwoong, Kim; De Simone, Danilo; Oh, Hye-Keun; Hur, Su-Mi (2019)

Power spectral density as template for modeling a metal-oxide nanocluster resist to obtain accurate resist roughness profiles

Severi, Joren; Welling, Ulrich; De Simone, Danilo; De Gendt, Stefan (2021)

Resist line edge roughness mitigation for high-NA EUVL

Ohtomi, Eisuke; Philipsen, Vicky; Severi, Joren; Welling, Ulrich; Tanaka, Yusuke; De Simone, Danilo (2022)

Resist reflow methodology development to investigate interfacial interactions

Severi, Joren; Chan, Cinzia; De Simone, Danilo; De Gendt, Stefan (2022)

Role of landing energy in e-beam metrology of thin photoresist for high-numerical aperture extreme ultraviolet lithography

Zidan, Mohamed; Fischer, Daniel; Severi, Joren; De Simone, Danilo; Moussa, Alain; Mullender, Angelika; Mack, Chris; Charley, Anne-Laure; Leray, Philippe; De Gendt, Stefan; Lorusso, Gian (2023)