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Chemically amplified resist CDSEM metrology exploration for high NA EUV lithography
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Authors
Severi, Joren
;
Lorusso, Gian F.
;
De Simone, Danilo
;
Moussa, Alain
;
Saib, Mohamed
;
Duflou, Rutger
;
De Gendt, Stefan
DOI
10.1117/1.JMM.21.2.021207
ISSN
1932-5150
Issue
2
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
Volume
21
Title
Chemically amplified resist CDSEM metrology exploration for high NA EUV lithography
Publication type
Journal article
Embargo date
2022-04-05
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2
20.500.12860/40253.2
*
2023-02-23T12:38:02Z
validation by library/open access desk
1
20.500.12860/40253
2022-08-12T02:39:10Z
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