dc.contributor.author | Severi, Joren | |
dc.contributor.author | Lorusso, Gian F. | |
dc.contributor.author | De Simone, Danilo | |
dc.contributor.author | Moussa, Alain | |
dc.contributor.author | Saib, Mohamed | |
dc.contributor.author | Duflou, Rutger | |
dc.contributor.author | De Gendt, Stefan | |
dc.date.accessioned | 2023-02-23T12:39:56Z | |
dc.date.available | 2022-08-12T02:39:10Z | |
dc.date.available | 2023-02-23T12:39:56Z | |
dc.date.issued | 2022 | |
dc.identifier.issn | 1932-5150 | |
dc.identifier.other | WOS:000835428700009 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40253.2 | |
dc.source | WOS | |
dc.title | Chemically amplified resist CDSEM metrology exploration for high NA EUV lithography | |
dc.type | Journal article | |
dc.contributor.imecauthor | Severi, Joren | |
dc.contributor.imecauthor | Lorusso, Gian F. | |
dc.contributor.imecauthor | De Simone, Danilo | |
dc.contributor.imecauthor | Moussa, Alain | |
dc.contributor.imecauthor | Saib, Mohamed | |
dc.contributor.imecauthor | Duflou, Rutger | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
dc.contributor.orcidimec | Duflou, Rutger::0000-0002-0357-1293 | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.contributor.orcidimec | Moussa, Alain::0000-0002-6377-4199 | |
dc.contributor.orcidimec | Saib, Mohamed::0000-0002-5153-5553 | |
dc.date.embargo | 2022-04-05 | |
dc.identifier.doi | 10.1117/1.JMM.21.2.021207 | |
dc.source.numberofpages | 13 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 02107 | |
dc.source.endpage | na | |
dc.source.journal | JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3 | |
dc.source.issue | 2 | |
dc.source.volume | 21 | |
imec.availability | Published - open access | |
dc.description.wosFundingText | The authors would like to thank Chris Mack for the fruitful discussion J.S. is an SB PhD fellow at FWO (1SA8919N). The authors declare no conflict of interest. | |