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Articles
Chemically amplified resist CDSEM metrology exploration for high NA EUV lithography
Publication:
Chemically amplified resist CDSEM metrology exploration for high NA EUV lithography
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Date
2022
Journal article
https://doi.org/10.1117/1.JMM.21.2.021207
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021207_1.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Severi, Joren
;
Lorusso, Gian F.
;
De Simone, Danilo
;
Moussa, Alain
;
Saib, Mohamed
;
Duflou, Rutger
;
De Gendt, Stefan
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
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465
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Acq. date: 2026-01-07
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1394
since deposited on 2022-08-12
Acq. date: 2026-01-07
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Downloads
465
since deposited on 2022-08-12
35
last month
6
last week
Acq. date: 2026-01-07
Views
1394
since deposited on 2022-08-12
Acq. date: 2026-01-07
Citations