Publication:

Chemically amplified resist CDSEM metrology exploration for high NA EUV lithography

Date

2022
Journal article
https://doi.org/10.1117/1.JMM.21.2.021207
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dc.contributor.authorSeveri, Joren
dc.contributor.authorLorusso, Gian F.
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorMoussa, Alain
dc.contributor.authorSaib, Mohamed
dc.contributor.authorDuflou, Rutger
dc.contributor.authorDe Gendt, Stefan
dc.contributor.imecauthorSeveri, Joren
dc.contributor.imecauthorLorusso, Gian F.
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorSaib, Mohamed
dc.contributor.imecauthorDuflou, Rutger
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecDuflou, Rutger::0000-0002-0357-1293
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecMoussa, Alain::0000-0002-6377-4199
dc.contributor.orcidimecSaib, Mohamed::0000-0002-5153-5553
dc.date.accessioned2023-02-23T12:39:56Z
dc.date.available2022-08-12T02:39:10Z
dc.date.available2023-02-23T12:39:56Z
dc.date.embargo2022-04-05
dc.date.issued2022
dc.description.wosFundingTextThe authors would like to thank Chris Mack for the fruitful discussion J.S. is an SB PhD fellow at FWO (1SA8919N). The authors declare no conflict of interest.
dc.identifier.doi10.1117/1.JMM.21.2.021207
dc.identifier.issn1932-5150
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40253
dc.publisherSPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS
dc.source.beginpage02107
dc.source.endpagena
dc.source.issue2
dc.source.journalJOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
dc.source.numberofpages13
dc.source.volume21
dc.title

Chemically amplified resist CDSEM metrology exploration for high NA EUV lithography

dc.typeJournal article
dspace.entity.typePublication
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