Publication:

Chemically amplified resist CDSEM metrology exploration for high NA EUV lithography

Date

2022
Journal article
https://doi.org/10.1117/1.JMM.21.2.021207
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021207_1.pdf 3.81 MB

Author(s)

Severi, Joren  
;
Lorusso, Gian F.
;
De Simone, Danilo  
;
Moussa, Alain  
;
Saib, Mohamed  
;
Duflou, Rutger  
;
De Gendt, Stefan  

Journal

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3

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