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Chemically amplified resist CDSEM metrology exploration for high NA EUV lithography
Publication:
Chemically amplified resist CDSEM metrology exploration for high NA EUV lithography
Date
2022
Journal article
https://doi.org/10.1117/1.JMM.21.2.021207
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021207_1.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Severi, Joren
;
Lorusso, Gian F.
;
De Simone, Danilo
;
Moussa, Alain
;
Saib, Mohamed
;
Duflou, Rutger
;
De Gendt, Stefan
Journal
JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3
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338
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1391
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Acq. date: 2025-10-30
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Downloads
338
since deposited on 2022-08-12
12
last week
Acq. date: 2025-10-30
Views
1391
since deposited on 2022-08-12
1
last week
Acq. date: 2025-10-30
Citations