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Molecular modeling of EUV photoresist revealing the effect of chain conformation on line edge roughness formation
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Authors
Park, Juhae
;
Lee, Sung-Gyu
;
Vesters, Yannick
;
Severi, Joren
;
Myungwoong, Kim
;
De Simone, Danilo
;
Oh, Hye-Keun
;
Hur, Su-Mi
ISSN
2073-4360
Issue
12
Journal
Polymers
Volume
11
Title
Molecular modeling of EUV photoresist revealing the effect of chain conformation on line edge roughness formation
Publication type
Journal article
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