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Molecular modeling of EUV photoresist revealing the effect of chain conformation on line edge roughness formation
Publication:
Molecular modeling of EUV photoresist revealing the effect of chain conformation on line edge roughness formation
Date
2019
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Park, Juhae
;
Lee, Sung-Gyu
;
Vesters, Yannick
;
Severi, Joren
;
Myungwoong, Kim
;
De Simone, Danilo
;
Oh, Hye-Keun
;
Hur, Su-Mi
Journal
Polymers
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1897
since deposited on 2021-10-27
Acq. date: 2025-10-26
Citations
Metrics
Views
1897
since deposited on 2021-10-27
Acq. date: 2025-10-26
Citations