Molecular modeling of EUV photoresist revealing the effect of chain conformation on line edge roughness formation

dc.contributor.author	Park, Juhae
dc.contributor.author	Lee, Sung-Gyu
dc.contributor.author	Vesters, Yannick
dc.contributor.author	Severi, Joren
dc.contributor.author	Myungwoong, Kim
dc.contributor.author	De Simone, Danilo
dc.contributor.author	Oh, Hye-Keun
dc.contributor.author	Hur, Su-Mi
dc.contributor.imecauthor	Severi, Joren
dc.contributor.imecauthor	De Simone, Danilo
dc.contributor.orcidimec	De Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned	2021-10-27T15:33:42Z
dc.date.available	2021-10-27T15:33:42Z
dc.date.issued	2019
dc.identifier.issn	2073-4360
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/33748
dc.identifier.url	https://doi.org/10.3390/polym11121923
dc.source.beginpage	1923
dc.source.issue	12
dc.source.journal	Polymers
dc.source.volume	11
dc.title	Molecular modeling of EUV photoresist revealing the effect of chain conformation on line edge roughness formation
dc.type	Journal article
dspace.entity.type	Publication
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