Publication:

28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV Lithography

Date

2021
Proceedings Paper
https://doi.org/10.1117/12.2584713
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Author(s)

Kim, Il Hwan
;
Kim, Insung
;
Park, Changmin
;
Lee, Jsiun
;
Ryu, Koungmin
;
De Schepper, P.
;
Doise, J.
;
Kocsis, M.
;
De Simone, Danilo  
;
Kljucar, Luka  
;
Das, Poulomi  
;
Blanc, Romuald  
;
Beral, Christophe  
;
Severi, Joren  
;
Vandenbroeck, Nadia  
;
Foubert, Philippe  
;
Charley, Anne-Laure  
;
Oak, Apoorva  
;
Xu, Dongbo  
;
Gillijns, Werner  
;
Mitard, Jerome  
;
Tokei, Zsolt  
;
van der Veen, Marleen  
;
Heylen, Nancy  
;
Teugels, Lieve  
;
Le, Quoc Toan  
;
Schleicher, Filip  
;
Leray, Philippe  
;
Ronse, Kurt  

Journal

Proceedings of SPIE

Abstract

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