Authors

Kim, Il Hwan; Kim, Insung; Park, Changmin; Lee, Jsiun; Ryu, Koungmin; De Schepper, P.; Doise, J.; Kocsis, M.; De Simone, Danilo; Kljucar, Luka; Das, Poulomi; Blanc, Romuald; Beral, Christophe; Severi, Joren; Vandenbroeck, Nadia; Foubert, Philippe; Charley, Anne-Laure; Oak, Apoorva; Xu, Dongbo; Gillijns, Werner; Mitard, Jerome; Tokei, Zsolt; van der Veen, Marleen; Heylen, Nancy; Teugels, Lieve; Le, Quoc Toan; Schleicher, Filip; Leray, Philippe; Ronse, Kurt

DOI

10.1117/12.2584713

EISBN

978-1-5106-4052-8

ISBN

978-1-5106-4051-1

ISSN

0277-786X

Conference

Conference on Extreme Ultraviolet (EUV) Lithography XII

Journal

Proceedings of SPIE

Volume

11609

Title

28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV Lithography

Publication type

Proceedings paper