Browsing by author "Zidan, Mohamed"
Now showing items 1-11 of 11
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Dry Resist Metrology Readiness for High-NA EUVL
Lorusso, Gian; Van den Heuvel, Dieter; Zidan, Mohamed; Moussa, Alain; Beral, Christophe; Charley, Anne-Laure; De Simone, Danilo; De Silva, Anuja; Verveniotis, Elisseos; Haider, Ali; Kondo, Tsuyoshi; Shindo, Hiroyuki; Ebizuka, Yasushi; Isawa, Miki (2023) -
E-beam metrology and line local critical dimension uniformity of thin dry resist films for high numerical aperture extreme ultraviolet lithography
Zidan, Mohamed; Lorusso, Gian; De Simone, Danilo; De Silva, Anuja; Haider, Ali; Verveniotis, Elisseos; Moussa, Alain; De Gendt, Stefan (2023) -
e-beam metrology of thin resist for high NA EUVL
Lorusso, Gian; De Simone, Danilo; Zidan, Mohamed; Severi, Joren; Moussa, Alain; Dey, Bappaditya; Halder, Sandip; Goldenshtein, Alex; Houchens, Kevin; Santoro, Gaetano; Fischer, Daniel; Muellender, Angelika; Mack, Chris; Kondo, Tsuyoshi; Shohjoh, Tomoyasu; Ikota, Masami; Charley, Anne-Laure; De Gendt, Stefan; Leray, Philippe (2023) -
Extraction of Roughness Measurements from Thin Resists with Low Signal-to-Noise-Ratio (SNR) SEM Images by Applying Deep Learning Denoiser
Zidan, Mohamed; Dey, Bappaditya; De Simone, Danilo; Severi, Joren; Charley, Anne-Laure; Halder, Sandip; Leray, Philippe; De Gendt, Stefan; Lorusso, Gian (2022) -
Low-Voltage Aberration-Corrected SEM Metrology of Thin Resist for High-NA EUVL
Zidan, Mohamed; Fischer, Daniel; Lorusso, Gian; Severi, Joren; De Simone, Danilo; Moussa, Alain; Muellender, Angelika; Mack, Chris A.; Charley, Anne-Laure; Leray, Philippe; De Gendt, Stefan (2022) -
Metrology of Thin Resist for High NA EUVL
Lorusso, Gian; Beral, Christophe; Bogdanowicz, Janusz; De Simone, Danilo; Hasan, Mahmudul; Jehoul, Christiane; Moussa, Alain; Saib, Mohamed; Zidan, Mohamed; Severi, Joren; Truffert, Vincent; Van Den Heuvel, Dieter; Goldenshtein, Alex; Houchens, Kevin; Santoro, Gaetano; Fischer, Daniel; Muellender, Angelika; Hung, Joey; Koret, Roy; Turovets, Igor; Ausschnitte, Kit; Mack, Chris; Kondo, Tsuyoshi; Shohjoh, Tomoyasu; Ikota, Masami; Charley, Anne-Laure; Leray, Philippe (2022) -
Probabilistic Process Window: A new approach to focus-exposure analysis
Mack, Chris A.; Yannuzzi, Jonathan; Lorusso, Gian; Zidan, Mohamed; De Simone, Danilo; Weldeslassie, Ataklti; Vandenbroeck, Nadia; Foubert, Philippe; Beral, Christophe; Charley, Anne-Laure (2022) -
Probabilistic process window: a new approach to focus-exposure analysis
Mack, Chris A.; Yannuzzi, Jonathan; Lorusso, Gian; Zidan, Mohamed; De Simone, Danilo; Weldeslassie, Ataklti; Vandenbroeck, Nadia; Foubert, Philippe; Beral, Christophe; Charley, Anne-Laure (2023) -
Role of landing energy in e-beam metrology of thin photoresist for high-numerical aperture extreme ultraviolet lithography
Zidan, Mohamed; Fischer, Daniel; Severi, Joren; De Simone, Danilo; Moussa, Alain; Mullender, Angelika; Mack, Chris; Charley, Anne-Laure; Leray, Philippe; De Gendt, Stefan; Lorusso, Gian (2023) -
Unbiased roughness measurements from low signal-to-noise ratio scanning electron microscope images
Mack, Chris A.; Severi, Joren; Zidan, Mohamed; De Simone, Danilo; Lorusso, Gian (2023) -
Unbiased Roughness Measurements from Low Signal-to-Noise Ratio SEM Images
Mack, Chris A.; Severi, Joren; Zidan, Mohamed; De Simone, Danilo; Lorusso, Gian (2022)