Authors
Mack, Chris A.;
Yannuzzi, Jonathan;
Lorusso, Gian;
Zidan, Mohamed;
De Simone, Danilo;
Weldeslassie, Ataklti;
Vandenbroeck, Nadia;
Foubert, Philippe;
Beral, Christophe;
Charley, Anne-Laure
EISBN
978-1-5106-4982-8
ISBN
978-1-5106-4981-1
ISSN
0277-786X
Conference
Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference
Journal
Proceedings of SPIE
Volume
12053
Title
Probabilistic Process Window: A new approach to focus-exposure analysis
Publication type
Proceedings paper