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Probabilistic Process Window: A new approach to focus-exposure analysis

dc.contributor.authorMack, Chris A.
dc.contributor.authorYannuzzi, Jonathan
dc.contributor.authorLorusso, Gian
dc.contributor.authorZidan, Mohamed
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorWeldeslassie, Ataklti
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorFoubert, Philippe
dc.contributor.authorBeral, Christophe
dc.contributor.authorCharley, Anne-Laure
dc.date.accessioned2022-12-15T13:10:36Z
dc.date.available2022-09-08T02:38:57Z
dc.date.available2022-12-15T13:10:36Z
dc.date.issued2022
dc.identifier.isbn978-1-5106-4981-1
dc.identifier.issn0277-786X
dc.identifier.otherWOS:000844549800006
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40374.2
dc.sourceWOS
dc.titleProbabilistic Process Window: A new approach to focus-exposure analysis
dc.typeProceedings paper
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorZidan, Mohamed
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorWeldeslassie, Ataklti
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorBeral, Christophe
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecBeral, Christophe::0000-0003-1356-9186
dc.contributor.orcidimecCharley, Anne-Laure::0000-0003-4745-0167
dc.identifier.doi10.1117/12.2614445
dc.identifier.eisbn978-1-5106-4982-8
dc.source.numberofpages12
dc.source.peerreviewyes
dc.source.beginpage1205307
dc.source.conferenceConference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference
dc.source.conferencedateFEB 24-MAY 27, 2022
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.volume12053
imec.availabilityPublished - imec


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220.500.12860/40374.2*2022-12-15T13:09:22Zvalidation by library/open access desk
120.500.12860/403742022-09-08T02:38:57Z

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