Browsing by author "Vandenbroeck, Nadia"
Now showing items 1-20 of 41
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15nm HP patterning with EUV and SADP: key contributors for improvement of LWR, LER, and CDU
Xu, Kaidong; Souriau, Laurent; Hellin, David; Versluijs, Janko; Wong, Patrick; Vangoidsenhoven, Diziana; Vandenbroeck, Nadia; Dekkers, Harold; Shi, Xiaoping; Albert, Johan; Tan, Chi Lim; Vertommen, Johan; Coenegrachts, Bart; Orain, I.; Kimura, Y.; Wiaux, Vincent; Boullart, Werner (2013) -
28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV Lithography
Kim, Il Hwan; Kim, Insung; Park, Changmin; Lee, Jsiun; Ryu, Koungmin; De Schepper, P.; Doise, J.; Kocsis, M.; De Simone, Danilo; Kljucar, Luka; Das, Poulomi; Blanc, Romuald; Beral, Christophe; Severi, Joren; Vandenbroeck, Nadia; Foubert, Philippe; Charley, Anne-Laure; Oak, Apoorva; Xu, Dongbo; Gillijns, Werner; Mitard, Jerome; Tokei, Zsolt; van der Veen, Marleen; Heylen, Nancy; Teugels, Lieve; Le, Quoc Toan; Schleicher, Filip; Leray, Philippe; Ronse, Kurt (2021) -
Capture probability of assembly defects in 14 nm half-pitch line/space DSA patterns
Pathangi Sriraman, Hari; Chan, BT; Van Look, Lieve; Vandenbroeck, Nadia; Van Den Heuvel, Dieter; Cross, Andrew; Hong, Sung Eun; Nafus, Kathleen; D'Urzo, Lucia; Gronheid, Roel (2015) -
Characterization of a thermal freeze LLE double patterning process for predictive simulation
Robertson, Stewart; Wong, Patrick; Biafore, John; Vandenbroeck, Nadia; Wiaux, Vincent (2010) -
CMOS patterning over high aspect ratio topographies for N10/N7 using spin-on carbon hardmasks
Hopf, Toby; Ercken, Monique; Mannaert, Geert; Kunnen, Eddy; Tao, Zheng; Vandenbroeck, Nadia; Sebaai, Farid; Kikuchi, Yoshiaki; Mertens, Hans; Kubicek, Stefan; Demuynck, Steven; Horiguchi, Naoto (2017) -
CMOS patterning over high-aspect ratio topographies for N10/N7 using spin-on carbon hardmasks
Hopf, Toby; Ercken, Monique; Mannaert, Geert; Kunnen, Eddy; Tao, Zheng; Vandenbroeck, Nadia; Sebaai, Farid; Kikuchi, Yoshiaki; Mertens, Hans; Kubicek, Stefan; Demuynck, Steven; Horiguchi, Naoto (2017) -
Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow
Pathangi Sriraman, Hari; Chan, BT; Bayana, Hareen; Vandenbroeck, Nadia; Van Den Heuvel, Dieter; Van Look, Lieve; Rincon Delgadillo, Paulina; Cao, Yi; Kim, JiHoon; Lin, Guanyang; Parnell, Doni; Nafus, Kathleen; Harukawa, Ryota; Chikashi, Ito; Polli, Marco; D'Urzo, Lucia; Gronheid, Roel; Nealey, Paul (2015) -
Development of high-chi directed self-assembly process based on key learning from PS-b-PMMA system
Suh, Hyo Seon; Mannaert, Geert; Vandenbroeck, Nadia; Doise, Jan (2021) -
Directed self-assembly process integration – fin patterning
Sayan, Safak; Chan, BT; Marzook, Taisir; Vandenbroeck, Nadia; Altamirano Sanchez, Efrain; Gronheid, Roel; Singh, Arjun; Rincon Delgadillo, Paulina (2015) -
Double patterning induced process bias induced for various LPL alternatives
Wong, Patrick; Vandenbroeck, Nadia; Wiaux, Vincent; Gronheid, Roel (2010) -
DSA as a complementary lithography technique for contact hole patterning
Gronheid, Roel; Singh, Arjun; Sayan, Safak; Vandenbroeck, Nadia; Chan, BT; Vandenberghe, Geert (2013) -
DSA materials contributions to the defectivity performance of the 14nm half-pitch LiNe flow @ imec
Pathangi Sriraman, Hari; Vaid, Varun; Chan, BT; Vandenbroeck, Nadia; Li, Jin; Hong, Sung Eun; Cao, Yi; Durairaj, Baskaran; Lin, Guanyang; Somervell, Mark; Kitano, Takahiro; Harukawa, Ryota; Sah, Kaushik; Cross, Andrew; Bayana, Hareen; D'Urzo, Lucia; Gronheid, Roel (2016) -
Electrical verification of contact holes obtained with DSA of BCP
Rincon Delgadillo, Paulina; Bekaert, Joost; Vandenbroeck, Nadia; Gronheid, Roel; Chan, BT; van der Veen, Marleen; Vandersmissen, Kevin; Boemmels, Juergen; Luong, Vihn (2015) -
Evaluation of integration schemes for contact-hole grapho-epitaxy DSA: a study of substrate and template affinity control
Romo Negreira, Ainhoa; Younkin, Todd; Gronheid, Roel; Demuynck, Steven; Vandenbroeck, Nadia; Seo, Takehito; Guerrero, Douglas; Parnell, Doni; Muramatsu, Makoto; Shinichiro, Kawakami; Takashi, Yamauchi; Nafus, Kathleen; Somervell, Mark (2014) -
Improved cost-effectiveness of the block co-polymer anneal process for DSA
Pathangi Sriraman, Hari; Stokhof, Maarten; Knaepen, Werner; Vaid, Varun; Mallik, Arindam; Chan, BT; Vandenbroeck, Nadia; Maes, Jan; Gronheid, Roel (2016) -
Interactions between imaging layers during LPLE double patterning lithography
Robertson, Stewart; Wong, Patrick; De Bisschop, Peter; Vandenbroeck, Nadia; Wiaux, Vincent (2012) -
Interim investigation of CD-SEM resist shrinkage in 193nm lithography
Hoffmann, Thomas; Storms, Greet; Vandenbroeck, Nadia; Delvaux, Christie; Ercken, Monique; Pollentier, Ivan; Ronse, Kurt; Takuji, Tada; Felten, Frank; Wong, Evelyn (2002) -
Investigation of litho1-litho2 proximity differences for a LPLE double patterning process
Wong, Patrick; De Bisschop, Peter; Robertson, Stewart; Vandenbroeck, Nadia; Biafore, John; Wiaux, Vincent; Van de Kerkhove, Jeroen (2011) -
Key contributors for improvement of line width roughness, line edge roughness, and critical dimension uniformity: 15 nm half-pitch patterning with extreme ultraviolet and self-aligned double patterning
Xu, Kaidong; Souriau, Laurent; Hellin, David; Versluijs, Janko; Wong, Patrick; Vangoidsenhoven, Diziana; Vandenbroeck, Nadia; Dekkers, Harold; Shi, Xiaoping; Albert, Johan; Tan, Chi Lim; Vertommen, Johan; Coenegrachts, Bart; Orain, Isabelle; Kimura, Yoshie; Wiaux, Vincent; Boullart, Werner (2013-09) -
Line edge roughness and its increasing importance
Ercken, Monique; Storms, Greet; Delvaux, Christie; Vandenbroeck, Nadia; Leunissen, Peter; Pollentier, Ivan (2002)