Skip to content
Institutional repository
Communities & Collections
Browse all items
Scientific publications
Open knowledge
Log In
imec Publications
Conference contributions
CMOS patterning over high aspect ratio topographies for N10/N7 using spin-on carbon hardmasks
Publication:
CMOS patterning over high aspect ratio topographies for N10/N7 using spin-on carbon hardmasks
Copy permalink
Date
2017
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Hopf, Toby
;
Ercken, Monique
;
Mannaert, Geert
;
Kunnen, Eddy
;
Tao, Zheng
;
Vandenbroeck, Nadia
;
Sebaai, Farid
;
Kikuchi, Yoshiaki
;
Mertens, Hans
;
Kubicek, Stefan
;
Demuynck, Steven
;
Horiguchi, Naoto
Journal
Abstract
Description
Metrics
Views
1908
since deposited on 2021-10-24
1
last month
Acq. date: 2026-01-11
Citations
Metrics
Views
1908
since deposited on 2021-10-24
1
last month
Acq. date: 2026-01-11
Citations